Processing apparatus for forming a coating film on a substrate having a camera and a mirror member
A processing method including a step that takes an image of the end face of a reference substrate, whose warp amount is known, over the whole periphery thereof using a camera to obtain shape data of the end face of the reference substrate; a step that takes an image of the end face of a process substrate over the whole periphery thereof using a camera to obtain shape data of the end face of the process substrate; a step that calculates warp amount of the process substrate based on the obtained shape data; a step that forms a resist film on a surface of the process substrate; a step that determines the supply position from which an organic solvent is supplied to a peripheral portion of the resist film and dissolves the peripheral portion by the solvent supplied from the supply position to remove the same from the process substrate.
1 . A substrate processing apparatus comprising:
a coating liquid supplying unit configured to supply a coating liquid onto a surface of a process substrate;
an irradiating unit configured to irradiate a peripheral portion of the surface of the process substrate with energy beam;
at least one camera; and
a control unit,
wherein the control unit is configured to control the substrate processing apparatus to perform a procedure including:
a first step that takes an image of an end face of a reference substrate, whose warp amount is known, over a whole periphery of the reference substrate by means of said at least one camera;
a second step that performs image processing of the image taken in the first step, thereby to obtain shape data of the end face of the reference substrate over the whole periphery of the reference substrate;
a third step that takes an image of an end face of a process substrate over a whole periphery of the process substrate by means of said at least one camera;
a fourth step that performs image processing of the image taken in the third step, thereby to obtain shape data of the end face of the process substrate over the whole periphery of the process substrate;
a fifth step that calculates a warp amount of the process substrate based on the shape data obtained in the second step and the shape data obtained in the fourth step;
a sixth step that controls the coating liquid supplying unit and supplies a coating liquid to the surface of the process substrate thereby to form a coating film on the surface of the process substrate;
a periphery exposure step that controls, after the sixth step, the irradiating unit and exposes the coating film in the peripheral portion of the surface of the process substrate at a predetermined exposure width over the whole periphery of the process substrate, and
wherein in the periphery exposure step, the exposure width is determined based on the warp amount calculated in the fifth step.
2 . The substrate processing apparatus according to claim 1 , further comprising a heating unit configured to heat the process substrate,
wherein the control unit is configured to control the substrate processing apparatus to perform the procedure further including:
a seventh step that heats, after the sixth step, the coating unit film by means of the heating unit, wherein the third, fourth and fifth steps are performed after the seventh step.
3 . The substrate processing apparatus according to claim 2 , further comprising a memory unit that stores information on the process substrate,
wherein the control unit is configured to control the substrate processing apparatus to perform the procedure further including:
a storing step that stores in the memory unit information that the process substrate should not be subjected to an exposure process, if the warp amount calculated in the fifth step is greater than a threshold value.
4 . The substrate processing apparatus according to claim 1 , further comprising first and second rotary holding unit each configured to hold and rotate the process substrate,
wherein the control unit is configured to control the first rotary holding unit to rotate the process substrate in the third step, and wherein during rotation of the process substrate, the image of the end face of the process substrate over the whole periphery of the process substrate is taken by means of said at least one camera in the third step,
wherein the control unit is configured to control the second rotary holding unit to rotate the process substrate in the periphery exposure step, and wherein during rotation of the process substrate, the coating film in the peripheral portion of the surface of the process substrate is exposed at the predetermined exposure width over the whole periphery of the process substrate, and
wherein parts of the first rotary holding unit for holding the process substrate have a same size as parts of the second rotary holding unit for holding the process substrate.
5 . The substrate processing apparatus according to claim 1 , further comprising:
a second rotary holding unit configured to hold and rotate the process substrate; and
a mirror member having a reflecting surface that opposes the end face of the process substrate and a peripheral portion of a back surface of the process substrate held by the second rotary holding unit, the reflecting surface being inclined with respect to a rotation axis of the second rotary holding unit;
wherein one of said at least one camera has an imaging device that receives both first light and second light through a lens, the first light coming from a peripheral portion of a front surface of the process substrate held by the second rotary holding unit, and the second light being a reflected light of second light which comes from the end face of the process substrate held by the second rotary holding unit and is reflected by the reflecting surface.
6 . The substrate processing apparatus according to claim 1 , wherein:
the reference substrate is flat;
wherein the control unit is configured to control the substrate processing apparatus such that:
the second step obtains, as the shape data of the end face of the reference substrate, data on a first profile line passing through a center of the end face of the reference substrate;
the fourth step obtains, as the shape data of the end face of the process substrate, data on a second profile line passing through a center of the end face of the process substrate; and
the fifth step calculates the warp amount of the process substrate based on the data on the first profile line and the data on the second profile line.
7 . The substrate processing apparatus according to claim 1 , wherein the control unit is configured to control the substrate processing apparatus to perform the procedure further including:
a peripheral portion imaging step that takes an image of a peripheral portion of a surface of the process substrate by means of said at least one camera; and
an inspecting step that inspects condition of the end face of the process substrate through image processing of the image taken in the fourth step, and inspects condition of the peripheral portion of the process substrate through image processing of the image taken in the peripheral portion imaging step.