IP Library Granted Patent US 12,575,358
Granted Patent B2
US 12,575,358 · App. 17/865,386 · Granted Mar 10, 2026

Flow resistance generating unit and substrate treating apparatus including the same

Inventors: Jae Won Shin (Gyeonggi-do, KR); Jae Seong Lee (Gyeonggi-do, KR); Hae Won Choi (Daejeon, KR); Joon Ho Won (Gyeonggi-do, KR); Koriakin Anton (Chungcheongnam-do, KR); Min Woo Kim (Seoul, KR); Hyung Seok Kang (Gyeonggi-do, KR); Eung Su Kim (Gyeonggi-do, KR); Pil Kyun Heo (Gyeonggi-do, KR); Jin Yeong Sung (Gyeonggi-do, KR)
Assignee: SEMES CO., LTD.
H01L21/67034
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Quick Facts
Patent No.
US 12,575,358
App. No.
17/865,386
Granted
Mar 10, 2026
Kind
B2
Abstract

The present disclosure relates to a flow resistance generating unit that generates a flow resistance in a pipe to solve a flow imbalance problem due to a bent pipe and stabilizes an internal airflow, and a substrate treating apparatus including the same. The substrate treating apparatus comprises a fluid supply unit for supplying fluid for treating a substrate and including an upper fluid supply module for supplying the fluid to an upper portion of the substrate, a lower fluid supply module for supplying the fluid to a lower portion of the substrate, and a supply pipe connected to at least one of the upper fluid supply module and the lower fluid supply module, and a flow resistance generating unit installed in the supply pipe and for generating a flow resistance with respect to the fluid passing through the supply pipe.

Claims (49)

1 . An apparatus for treating a substrate comprising:

a housing;

a support unit installed in the housing and for supporting a substrate from both sides;

a heating member installed on a sidewall of the housing and for generating heat for treating the substrate;

a fluid supply unit for supplying fluid for treating the substrate to an inside of the housing and including an upper fluid supply module for supplying the fluid to an upper portion of the substrate, a lower fluid supply module for supplying the fluid to a lower portion of the substrate, and a supply pipe connected to at least one of the upper fluid supply module and the lower fluid supply module;

a flow resistance generating unit installed in the supply pipe and for generating a flow resistance with respect to the fluid passing through the supply pipe; and

a wing member that rotates the fluid and that is formed in an inner hole of at least one of the flow resistance generating unit, the supply pipe, the upper fluid supply module, or the lower fluid supply module, and

wherein the flow resistance generating unit is provided between a bent pipe included in the supply pipe and the upper fluid supply module, or is provided between the bent pipe and the lower fluid supply module.

2 . The apparatus of claim 1 , wherein the flow resistance generating unit generates a flow resistance with respect to fluid passing through the bent pipe and directed to the upper fluid supply module or the lower fluid supply module.

3 . The apparatus of claim 1 , wherein the flow resistance generating unit is provided between a bent pipe adjacent to the upper fluid supply module and the upper fluid supply module in response to the bent pipe being plural, or is provided between a bent pipe adjacent to the lower fluid supply module and the lower fluid supply module in response to the bent pipe being plural.

4 . The apparatus of claim 1 , wherein the flow resistance generating unit generates a flow resistance with respect to the fluid by limiting a flow rate of the fluid.

5 . The apparatus of claim 1 , wherein the flow resistance generating units are provided in plural.

6 . The apparatus of claim 5 , wherein the flow resistance generating units are respectively provided before and after the bent pipe.

7 . The apparatus of claim 1 , wherein the flow resistance generating unit comprises,

a body; and

the inner hole of the flow resistance generating unit is formed inside the body,

wherein a width of the inner hole is variable.

8 . The apparatus of claim 7 , wherein the inner hole includes a bottleneck section.

9 . The apparatus of claim 7 , wherein a width of the inner hole decreases toward a center and increases toward both ends.

10 . The apparatus of claim 1 , wherein the flow resistance generating unit is provided as any one of an orifice type structure, a multi-pipe type structure, and a buffer tank type structure.

11 . The apparatus of claim 10 , wherein, in response to the flow resistance generating unit being provided as an orifice type structure, the flow resistance generating unit has an internal hole including a bottleneck section.

12 . The apparatus of claim 10 , wherein, in response to the flow resistance generating unit being provided as a multi-pipe type structure, the flow resistance generating unit is rejoined after branching.

13 . The apparatus of claim 10 , wherein, in response to the flow resistance generating unit being provided as a buffer tank type structure, the flow resistance generating unit has an inner hole having a width greater than that of the supply pipe.

14 . The apparatus of claim 1 , wherein the flow resistance generating unit comprises,

a body;

the inner hole of the flow resistance generating unit is formed inside the body; and

the wing member protruding from an inner surface of the body.

15 . The apparatus of claim 14 , wherein the wing member is formed to extend from one end of the body to the other end along an inner circumference of the body.

16 . The apparatus of claim 14 , wherein the wing member is provided in plural, wherein the plurality of wing members are provided to be spaced apart from an inner surface of the body, and are provided at different heights.

17 . The apparatus of claim 1 , wherein the fluid is a supercritical fluid.

18 . An apparatus for treating a substrate comprising:

a housing;

a support unit installed in the housing and for supporting a substrate from both sides;

a heating member installed on a sidewall of the housing and for generating heat for treating the substrate;

a fluid supply unit for supplying fluid for treating the substrate to an inside of the housing and including an upper fluid supply module for supplying the fluid to an upper portion of the substrate, a lower fluid supply module for supplying the fluid to a lower portion of the substrate, and a supply pipe connected to at least one of the upper fluid supply module and the lower fluid supply module;

a flow resistance generating unit installed in the supply pipe and for generating a flow resistance with respect to the fluid passing through the supply pipe; and

a wing member that rotates the fluid and that is formed in an inner hole of at least one of the flow resistance generating unit, the supply pipe, the upper fluid supply module, or the lower fluid supply module,

wherein the flow resistance generating unit is provided between a bent pipe included in the supply pipe and the upper fluid supply module and generates a flow resistance with respect to fluid passing through the bent pipe and directed to the upper fluid supply module, or is provided between the bent pipe and the lower fluid supply module and generates a flow resistance with respect to fluid passing through the bent pipe and directed to the lower fluid supply module,

wherein the flow resistance generating unit is provided as any one of an orifice type structure, a multi-pipe type structure, and a buffer tank type structure,

wherein, in response to the flow resistance generating unit being provided as an orifice type structure, the flow resistance generating unit has an inner hole including a bottleneck section,

wherein, in response to the flow resistance generating unit being provided as a multi-pipe type structure, the flow resistance generating unit is rejoined after branching, and

wherein, in response to the flow resistance generating unit being provided as a buffer tank type structure, the flow resistance generating unit has an inner hole having a width greater than that of the supply pipe.

19 . A flow resistance generating unit comprising:

a body; and

an inner hole formed inside the body

wherein the flow resistance generating unit is provided in a supply pipe for supplying the fluid to an inside of a housing of an apparatus for treating a substrate, in which the substrate is disposed, to treat the substrate,

wherein the flow resistance generating unit is provided between a bent pipe included in the supply pipe and a fluid supply module installed in the housing for transferring the fluid to an upper portion and a lower portion of the substrate and generates a flow resistance to fluid passing through the bent pipe and directed to the fluid supply module,

wherein the flow resistance generating unit generates a flow resistance with respect to the fluid by limiting a flow rate of the fluid through a change in a width of the inner hole, and

wherein a wing member that rotates the fluid is formed in an inner hole of at least one of the flow resistance generating unit, the supply pipe, or the fluid supply module.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 6, 2022
From: SHIN, JAE WON; LEE, JAE SEONG; CHOI, HAE WON; WON, JOON HO; ANTON, KORIAKIN; KIM, MIN WOO; KANG, HYUNG SEOK; KIM, EUNG SU; HEO, PIL KYUN; SUNG, JIN YEONG
To: SEMES CO., LTD.
Reel/Frame 060738/0677 →
Priority Claims (1)
KR 10-2021-0134392 · Oct 8, 2021 · national
Continuity (1)
Related Publication 20230113184A1 · Apr 13, 2023
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