In situ renewable electrode for Z-pinch plasma confinement system
Methods and systems are provided for Z-pinch plasma and other plasma confinement utilizing various electrode compositions and configurations. In one example, a plasma confinement system includes a plurality of electrodes, each electrode of the plurality of electrodes arranged coaxially with respect to an assembly region of the plasma confinement system and positioned so as to be exposed to the assembly region, wherein one or more electrodes of the plurality of electrodes includes an electrode material which releases hydrogen gas above a threshold temperature. In an additional or alternative example, a plasma confinement system includes an electrode body including a nosecone, and a liquid metal, a portion of the liquid metal forming a protective film between a surface of the nosecone and an exterior of the nosecone during operation of the plasma confinement system.
1 . A method, comprising:
flowing a liquid metal, at a liquid metal flow rate, from an internal reservoir of an electrode to an external surface of the electrode, the electrode extending axially within a plasma confinement chamber;
generating, within the plasma confinement chamber, a confined plasma that is to ablate the liquid metal from the external surface at a liquid metal ablation rate; and
responsive to the liquid metal flow rate deviating from the liquid metal ablation rate by greater than a threshold magnitude, adjusting the liquid metal flow rate by adjusting one or more of a liquid metal level in the internal reservoir, an inert gas pressure in the internal reservoir, or a liquid metal temperature.
2 . The method of claim 1 , wherein flowing the liquid metal at the liquid metal flow rate comprises:
supplying the liquid metal to the internal reservoir up to the liquid metal level; and
supplying an inert gas to the internal reservoir until the inert gas pressure is met.
3 . The method of claim 1 , wherein flowing the liquid metal at the liquid metal flow rate comprises maintaining the liquid metal temperature by flowing a heat exchange fluid through the electrode and/or adjusting heat from an internal heating coil of the electrode.
4 . The method of claim 1 , wherein adjusting the inert gas pressure comprises increasing, on average, the inert gas pressure over a lifetime use of the electrode.
5 . The method of claim 1 , wherein the liquid metal flow rate is nonzero prior to and following adjusting the liquid metal flow rate.
6 . The method of claim 1 , further comprising:
responsive to the liquid metal level being less than or equal to a threshold level:
ceasing flow of the liquid metal from the internal reservoir; and
removing at least a portion of the liquid metal from the external surface by increasing the liquid metal temperature.
7 . The method of claim 1 , further comprising adjusting the liquid metal ablation rate by adjusting a repetition rate of a discharge current sustaining the confined plasma.
8 . The method of claim 6 , further comprising, upon ceasing the flow of the liquid metal from the internal reservoir responsive to the liquid metal level being less than or equal to the threshold level, clearing at least a portion of the liquid metal within the internal reservoir via purging with a gas.
9 . The method of claim 1 , wherein the liquid metal flows to the external surface via a plurality of internal liquid flow channels positioned within the electrode, the plurality of internal liquid flow channels fluidically coupling the internal reservoir to the external surface.
10 . The method of claim 9 , wherein, upon flowing the liquid metal from the internal reservoir to the external surface, a first portion of the liquid metal forms a protective film between the external surface and the plasma confinement chamber, and wherein a remaining, second portion of the liquid metal flows from the internal reservoir and along the plurality of internal liquid flow channels towards the external surface.
11 . The method of claim 10 , wherein adjusting the liquid metal flow rate responsive to the liquid metal flow rate deviating from the liquid metal ablation rate by greater than the threshold magnitude maintains the protective film at a consistent thickness.
12 . The method of claim 11 , further comprising setting a predetermined value corresponding to the consistent thickness of the protective film.
13 . The method of claim 10 , wherein each internal liquid flow channel of the plurality of internal liquid flow channels comprises:
a main liquid flow channel fluidly coupled to and extending from the internal reservoir; and
a plurality of liquid flow capillaries that fluidly couple the main liquid flow channel to the plasma confinement chamber, where the protective film is retained on the external surface via capillary action induced by the plurality of liquid flow capillaries.
14 . The method of claim 1 , wherein the electrode is positioned so as to expose the external surface to the plasma confinement chamber, and wherein the electrode comprises a Ti-based material that is to release hydrogen gas, above a threshold temperature, to be used in the generation of the confined plasma.
15 . The method of claim 1 , wherein the electrode comprises one or more of a metal, graphite, or a semiconductor.
16 . The method of claim 1 , wherein the internal reservoir is positioned with respect to the external surface such that gravitational force assists in increasing the liquid metal flow rate as the liquid metal flows from the internal reservoir to the external surface.
17 . The method of claim 1 , further comprising setting a preselected value, of the liquid metal flow rate, at which to flow the liquid metal from the internal reservoir to the external surface.
18 . The method of claim 17 , wherein the preselected value is based on the inert gas pressure in the internal reservoir, the liquid metal level in the internal reservoir, the liquid metal temperature, an amount of fuel gas provided to the plasma confinement chamber, and/or a magnitude of a discharge current to be applied to sustain the plasma.
19 . The method of claim 1 , wherein generating the confined plasma comprises:
providing, to the plasma confinement chamber, the plasma that is to be confined or a fuel gas that is to be converted into the plasma; and
applying a Z-pinch discharge current within the plasma confinement chamber to confine the plasma as a Z-pinch plasma.
20 . The method of claim 1 , further comprising continually replenishing the external surface with the liquid metal as the confined plasma ablates the liquid metal.