Granted Patent B2

US 12,610,447 · App. 17/536,487 · Granted Apr 21, 2026

Inventors: Uri Shumlak (Seattle, WA); Harry S. McLean (Seattle, WA); Brian A. Nelson (Seattle, WA)

Assignees: University of Washington; Lawrence Livermore National Security, LLC

H05H1/06G21B1/21H05H1/16H05H1/54G21B1/05G21B1/11Y02E30/10

Abstract

Claims (38)

1 . A plasma confinement system comprising:

an inner electrode;

an intermediate electrode that at least partially surrounds the inner electrode, wherein an acceleration region is radially between the inner electrode and the intermediate electrode; and

an outer electrode that at least partially surrounds the intermediate electrode, wherein an assembly region is between a first end of the inner electrode and a second end of the outer electrode, the outer electrode comprising:

a solid shell that at least partially surrounds the assembly region; and

an electrically conductive material within the assembly region and disposed on the solid shell on a longitudinal axis of the plasma confinement system, at the second end of the outer electrode, wherein the electrically conductive material has a melting point within a range of 180° C. to 800° C. at 1 atmosphere of pressure,

wherein the plasma confinement system is configured to establish, via a voltage applied between the inner electrode and the solid shell of the outer electrode, a Z-pinch plasma through which current is to flow between the first end of the inner electrode and the electrically conductive material at the second end of the outer electrode.

2 . The plasma confinement system of claim 1 , further comprising a feeding mechanism that is configured to move the inner electrode along the longitudinal axis of the plasma confinement system.

3 . The plasma confinement system of claim 1 , further comprising a cooling system that is configured to cool the inner electrode during operation of the plasma confinement system.

4 . The plasma confinement system of claim 1 , further comprising:

a first power supply configured to apply a first voltage between the inner electrode and the intermediate electrode; and

a second power supply configured to apply a second voltage between the inner electrode and the outer electrode.

5 . The plasma confinement system of claim 1 , wherein the electrically conductive material comprises one or more of lithium, lead, or tin.

6 . The plasma confinement system of claim 1 , wherein the first end of the inner electrode is at least partially surrounded by the outer electrode.

7 . The plasma confinement system of claim 1 , wherein a pool region is formed at the second end of the outer electrode, the pool region serving as a reservoir that retains an amount of the electrically conductive material.

8 . The plasma confinement system of claim 7 , wherein the solid shell comprises:

a solid conductive outer shell; and

a solid inner shell that is disposed within the solid conductive outer shell and in contact with the solid conductive outer shell,

wherein the solid inner shell comprises:

an axial wall that at least partially encircles the longitudinal axis of the plasma confinement system; and

a radial wall that couples the axial wall to the solid conductive outer shell,

wherein the axial wall comprises a third end that faces a fourth end of the outer electrode, and

wherein the radial wall and the second end of the outer electrode form the pool region, the plasma confinement system further comprising:

a heat exchanger; and

a first port configured to guide the electrically conductive material from the heat exchanger into the pool region.

9 . The plasma confinement system of claim 8 , the plasma confinement system further comprising:

one or more pumps configured to move the electrically conductive material from the pool region to a region that is outside the axial wall and separated from the pool region by the radial wall.

10 . The plasma confinement system of claim 1 , further comprising a pumping system configured to circulate the electrically conductive material over the solid shell when the electrically conductive material is in a liquid state.

11 . The plasma confinement system of claim 10 , wherein the pumping system is configured to circulate the electrically conductive material such that movement of the electrically conductive material includes one or more of an azimuthal component or an axial component with respect to the longitudinal axis of the plasma confinement system.

12 . The plasma confinement system of claim 1 , the first end of the inner electrode being formed of graphite or carbon fiber.

13 . The plasma confinement system of claim 1 , further comprising one or more gas ports configured to direct gas into the acceleration region.

14 . The plasma confinement system of claim 1 , wherein the inner electrode is at least partially surrounded by the outer electrode.

15 . The plasma confinement system of claim 14 , wherein the first end of the inner electrode is rounded.

16 . The plasma confinement system of claim 1 , further comprising an insulator between a third end of the outer electrode and the intermediate electrode.

17 . The plasma confinement system of claim 1 , wherein the plasma confinement system is configured to establish the Z-pinch plasma within the assembly region and along the longitudinal axis of the plasma confinement system.

18 . The plasma confinement system of claim 17 , wherein the Z-pinch plasma has axial flow that varies in a radial direction.

19 . The plasma confinement system of claim 1 , wherein the electrically conductive material allows current to flow between the inner electrode and the outer electrode through both the Z-pinch plasma and the electrically conductive material.

20 . The plasma confinement system of claim 1 , wherein the intermediate electrode forms a cavity and the inner electrode is positioned at least partially within the cavity.

Assignments (3)

Continuity (3)

References Cited (159)