Methods for optical proximity correction and methods of manufacturing semiconductor devices having the same
Methods for optical proximity correction (OPC), which may include inputting curved layout data corresponding to a target layer to be formed; performing manhattanization based on the curved layout data and acquiring manhattanized data; performing fragmentation on the manhattanized data and decomposing the manhattanized data into a plurality of data components; generating an OPC model based on the plurality of data components and performing a simulation on the OPC model to extract a contour of the OPC model; calculating an overlap score between the contour of the OPC model and a layer that is adjacent to the target layer and reflecting the calculated overlap score in the OPC model; and acquiring design data for forming the target layer based on the simulation result. Therefore, it is possible to obtain design data having positioning optimized according to positioning a target layer in consideration of an adjacent layer by the method for optical proximity correction according to some example embodiments of the present disclosure.
1 . A method for optical proximity correction (OPC), comprising:
inputting curved layout data corresponding to a target layer to be formed;
performing manhattanization based on the curved layout data and acquiring manhattanized data;
performing fragmentation on the manhattanized data and decomposing the manhattanized data into a plurality of data components;
generating an OPC model based on the plurality of data components and performing a simulation on the OPC model to extract a contour of the OPC model;
calculating an overlap score between the contour of the OPC model and a layer that is adjacent to the target layer;
adjusting the OPC model based on the calculated overlap score; and
acquiring design data for forming the target layer based on the simulation result.
2 . The method of claim 1 , wherein the design data is optimized by performing the simulation and acquiring the design data a plurality of times.
3 . The method of claim 2 , wherein positioning of the design data is optimized using positioning of the curved layout data.
4 . The method of claim 1 , further comprising:
calculating an edge placement error (EPE) between the target layer and the contour of the OPC model after performing the simulation.
5 . The method of claim 4 , further comprising:
moving locations of the plurality of data components based on the EPE after performing the simulation.
6 . The method of claim 1 , wherein the manhattanized data is data in a form of polygons including a pattern using only 0°, 45°, and/or 90° angles.
7 . The method of claim 1 , wherein arbitrarily adjacent points are set in the curved layout data, and when an angle between two tangents at the arbitrary adjacent points is smaller than a critical angle, the manhattanization is performed based on the two tangents.
8 . The method of claim 7 , wherein the critical angle is an acute angle greater than 0° and less than 90°.
9 . The method of claim 1 , wherein the curved layout data has a same shape as an image of the target layer.
10 . The method of claim 1 , wherein the adjacent layer is a layer of a plurality of layers that includes a first layer that overlaps the target layer and a second layer that does not overlap the target layer.
11 . The method of claim 10 , wherein as an area in which the contour of the OPC model and the first layer overlap increases, the overlap score has a greater value.
12 . The method of claim 10 , wherein as an area in which the contour of the OPC model and the second layer decreases, the overlap score has a greater value.
13 . The method of claim 10 , wherein the second layer includes at least one first pattern that does not overlap the target layer on the same plane as the target layer and at least one second pattern that does not overlap the target layer in a direction that is perpendicular to an upper surface of the target layer.
14 . A method for optical proximity correction, comprising:
inputting curved layout data corresponding to a target layer to be formed;
performing manhattanization based on the curved layout data and acquiring manhattanized data;
performing a simulation for correcting an optical proximity effect using the manhattanized data; and
acquiring design data for forming the target layer without modifying the curved layout data based on the simulation result; and
wherein after performing the simulation, the optical proximity correction (OPC) is performed based on an overlap score calculated between a contour of the OPC model and a layer that is adjacent to the target layer.
15 . The method of claim 14 , wherein the overlap score is further calculated based on an overlap between the contour of the OPC model and a feature of the target layer.
16 . A method of manufacturing a semiconductor device, comprising:
performing manhattanization on curved layout data for a target layer, and performing optical proximity correction (OPC) based on the manhattanized data;
acquiring design data based on the performed optical proximity correction; and
forming a photoresist pattern on a substrate using a photomask manufactured based on the design data,
wherein the optical proximity correction further includes calculating an overlap score between a contour of the OPC model and a layer that is adjacent to the target layer, and adjusting the OPC model using the calculated overlap score.
17 . The method of claim 16 , wherein the target layer corresponds to a floating diffusion region constituting an image sensor.
18 . The method of claim 16 , wherein the adjacent layer includes a contact and a transfer gate structure constituting an image sensor.
19 . The method of claim 16 , wherein the target layer has a curved shape or has a “C” shape.
20 . The method of claim 16 , wherein the overlap score is further calculated based on an overlap between the contour of the OPC model and a feature of the target layer.