IP Library Granted Patent US 12,614,844
Granted Patent B2
US 12,614,844 · App. 17/957,752 · Granted Apr 28, 2026

Photonically steered impedance surface antennas

Inventors: Zhen Zhou (Chandler, AZ); Tae Young Yang (Portland, OR); Timo Huusari (Hillsboro, OR); Renzhi Liu (Portland, OR); Wei Qian (Walnut, CA); Mengyuan Huang (Cupertino, CA); Jason Mix (Portland, OR)
Assignee: Intel Corporation
H01Q3/2676H01L23/49827H01L23/66H01L2223/6677
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Quick Facts
Patent No.
US 12,614,844
App. No.
17/957,752
Granted
Apr 28, 2026
Kind
B2
Abstract

Photonically steered impedance surface antennas are disclosed. A disclosed example apparatus includes a semiconductor substrate to be communicatively coupled to a radio frequency (RF) source, an at least partially transparent dielectric layer, the semiconductor substrate at a first side of the at least partially transparent dielectric layer, an at least partially transparent conductive film at a second side of the at least partially transparent dielectric layer that is opposite the first side of the at least partially transparent dielectric layer, and an illumination source to illuminate at least a portion of the semiconductor substrate to generate a photoinduced solid-state plasma pattern that beam steers an RF signal corresponding to the RF source.

Claims (34)

1 . An apparatus comprising:

a semiconductor substrate to be communicatively coupled to a radio frequency (RF) source, the RF source including a radio frequency integrated circuit (RFIC);

an at least partially transparent dielectric layer, the semiconductor substrate at a first side of the at least partially transparent dielectric layer;

an at least partially transparent conductive film at a second side of the at least partially transparent dielectric layer that is opposite the first side; and

an illumination source to illuminate at least a portion of the semiconductor substrate to generate a photoinduced solid-state plasma pattern that beam steers an RF signal corresponding to the RF source.

2 . The apparatus as defined in claim 1 , wherein the at least partially transparent conductive film is at least partially composed of indium tin oxide (ITO).

3 . The apparatus as defined in claim 1 , wherein the illumination source includes a two dimensional grid of light emitting diodes (LEDs) controlled by control circuitry.

4 . The apparatus as defined in claim 1 , wherein the illumination source includes a two-dimensional grid of lasers controlled by control circuitry or a laser with a programmable optical equalization device.

5 . The apparatus as defined in claim 1 , wherein the at least partially transparent dielectric layer includes an IR transparent substrate.

6 . The apparatus as defined in claim 5 , wherein the RFIC is communicatively coupled to the semiconductor substrate by a via that extends through the IR transparent substrate.

7 . The apparatus as defined in claim 1 , including a restraint fixture to position the at least partially transparent dielectric layer relative to the illumination source.

8 . The apparatus as defined in claim 1 , wherein the illumination source is to illuminate the at least the portion of the semiconductor substrate to define photoinduced patches of different sizes.

9 . An antenna comprising:

a semiconductor substrate;

an at least partially transparent ground plane; and

an at least partially transparent dielectric layer between the ground plane and the semiconductor substrate, wherein an optical light source is to emit light incident on the at least partially transparent ground plane to illuminate a portion of the semiconductor substrate to define a photoinduced solid-state plasma pattern to steer a radio frequency (RF) signal corresponding to an RF source communicatively coupled to the antenna, the RF source including a radio frequency integrated circuit (RFIC).

10 . The antenna as defined in claim 9 , including an illumination source.

11 . The antenna as defined in claim 10 , wherein the illumination source includes a two-dimensional grid of light sources controlled by control circuitry to vary illumination across the semiconductor substrate and define patches of differing impedance of the semiconductor substrate.

12 . The antenna as defined in claim 9 , wherein the at least partially transparent dielectric layer includes glass.

13 . The antenna as defined in claim 12 , including a through-glass via that extends through the glass, the through-glass via to communicatively couple the RF source to the photoinduced solid-state plasma pattern.

14 . The antenna as defined in claim 9 , wherein the at least partially transparent ground plane includes indium tin oxide (ITO).

15 . A non-transitory machine readable storage medium comprising instructions to cause at least one processor circuit to at least:

cause a radio frequency integrated circuit (RFIC) to provide a radio frequency (RF) signal to a semiconductor substrate, the semiconductor substrate coupled to an at least partially transparent dielectric layer at a first side of the at least partially transparent dielectric layer, an at least partially transparent conductive film at a second side of the at least partially transparent dielectric layer that is opposite the first side; and

cause an illumination source to illuminate at least a portion of the semiconductor substrate to photoinduce a solid-state plasma pattern of the semiconductor substrate to beam steer the RF signal.

16 . The non-transitory machine readable storage medium as defined in claim 15 , wherein the instructions cause one or more of the at least one processor circuit to determine a pattern of the illumination source based on a beam steering setting.

17 . The non-transitory machine readable storage medium as defined in claim 16 , wherein the pattern of the illumination source is determined based on a phase of the signal.

18 . The non-transitory machine readable storage medium as defined in claim 16 , wherein the pattern defines first pixels of the illumination source that emit light and second pixels of the illumination source that are not to emit light.

19 . The non-transitory machine readable storage medium as defined in claim 16 , wherein the pattern generally resembles a wave pattern.

20 . The non-transitory machine readable storage medium as defined in claim 16 , wherein the instructions cause one or more the at least one processor circuit to determine a pixelization pattern of the semiconductor substrate corresponding to the beam steering thereof.

21 . A method comprising:

providing, via a radio frequency integrated circuit (RFIC), a radio frequency (RF) signal to a semiconductor substrate, the semiconductor substrate at a first side of an at least partially transparent dielectric layer, an at least partially transparent conductive film at a second side of the at least partially transparent dielectric layer that is opposite the first side; and

emitting, via an illumination source, light toward at least a portion of the semiconductor substrate to photoinduce a solid-state plasma pattern of the semiconductor substrate to beam steer the RF signal.

22 . The method as defined in claim 21 , including varying a pattern of the emitted light toward the semiconductor substrate to vary the beam steering of the RF signal.

23 . The method as defined in claim 21 , including varying an amount of the semiconductor substrate illuminated by the illumination source to control the beam steering of the RF signal.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 18, 2026
From: INTEL CORPORATION
To: INTEL FOUNDRY IP LLC
Reel/Frame 076064/0951 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 28, 2023
From: ZHOU, ZHEN; YANG, TAE YOUNG; HUUSARI, TIMO; LIU, RENZHI; QIAN, WEI; HUANG, MENGYUAN; MIX, JASON
To: INTEL CORPORATION
Reel/Frame 062539/0431 →
Continuity (1)
Related Publication 20240120651A1 · Apr 11, 2024
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