IP Library › Granted Patent US 12,617,981
Granted Patent B2
US 12,617,981 · App. 18/358,791 · Granted May 5, 2026

Pressure-sensitive adhesive sheet for semiconductor processing

Inventors: Jun Akiyama (Ibaraki, JP); Yuji Kato (Ibaraki, JP); Taiki Ueno (Ibaraki, JP)
Assignee: NITTO DENKO CORPORATION
C09J7/385C08F220/1808C08F220/1812C09J11/06C09J133/066H10P72/7402C08F2500/22C08F2500/26C08F2800/10C08K5/524C09J2203/326C09J2301/302C09J2301/312C09J2301/408C09J2423/006C09J2467/006
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Quick Facts
Patent No.
US 12,617,981
App. No.
18/358,791
Granted
May 5, 2026
Kind
B2
Abstract

Provided is a pressure-sensitive adhesive sheet for semiconductor processing having excellent solvent resistance. The pressure-sensitive adhesive sheet for semiconductor processing includes a pressure-sensitive adhesive layer formed of a pressure-sensitive adhesive composition containing a base polymer, and a base material. The pressure-sensitive adhesive composition has a swelling degree S A of 2.1 times or less when immersed in an N,N-dimethylpropionamide solution at 23° C. for 1 hour.

Claims (12)

1 . A pressure-sensitive adhesive sheet for semiconductor processing, comprising:

a pressure-sensitive adhesive layer formed of a pressure-sensitive adhesive composition containing a base polymer; and

a base material,

wherein the pressure-sensitive adhesive composition has a swelling degree S A of 2.1 times or less when immersed in an N,N-dimethylpropionamide solution at 23° C. for 1 hour,

wherein the pressure-sensitive adhesive composition is a UV-curable pressure-sensitive adhesive, and

wherein a content ratio of a cross-linking agent is in a range from 0.01 part by weight to 0.75 part by weight with respect to 100 parts by weight of the base polymer.

2 . The pressure-sensitive adhesive sheet for semiconductor processing according to claim 1 , wherein a content ratio of an ester of one of acrylic acid or methacrylic acid having an alkyl group having 8 or more carbon atoms in all monomer components for forming the base polymer is 50 wt % or more.

3 . The pressure-sensitive adhesive sheet for semiconductor processing according to claim 1 , wherein the base polymer is a polymer having a carbon-carbon double bond introduced thereinto.

4 . The pressure-sensitive adhesive sheet for semiconductor processing according to claim 1 , wherein the base material contains one of a polyester-based resin or a polyolefin-based resin.

5 . The pressure-sensitive adhesive sheet for semiconductor processing according to claim 1 , wherein the pressure-sensitive adhesive composition further contains a phosphoric acid ester-based surfactant.

6 . The pressure-sensitive adhesive sheet for semiconductor processing according to claim 5 , wherein a content of the phosphoric acid ester-based surfactant is 0.03 part by weight or more with respect to 100 parts by weight of the base polymer.

7 . The pressure-sensitive adhesive sheet for semiconductor processing according to claim 1 , wherein the pressure-sensitive adhesive sheet for semiconductor processing is used in a semiconductor processing process including a solvent washing step.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 4, 2023
From: AKIYAMA, JUN; KATO, YUJI; UENO, TAIKI
To: NITTO DENKO CORPORATION
Reel/Frame 064496/0023 →
Priority Claims (1)
JP 2022-119112 · Jul 26, 2022 · national
Continuity (1)
Related Publication 20240034914A1 · Feb 1, 2024
References Cited (4)
US 20080118764A1 · Shintani · 2008 [cited by examiner]
US 20110053346A1 · Matsumura · 2011 [cited by examiner]
JP 5607847B1 · 2014 [cited by applicant]
WO 2018083987A1 · 2018 [cited by applicant]