IP Library › Granted Patent US 12,641,915
Granted Patent B2
US 12,641,915 · App. 18/022,676 · Granted May 26, 2026

Semiconductor device having a cavity under lens portion

Inventor: Gunasagar S. (Singapore, SG)
Assignee: CompoundTek Pte. Ltd
H10F77/484H01S5/02253H10F71/00H10H20/855H10H20/0363
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Quick Facts
Patent No.
US 12,641,915
App. No.
18/022,676
Granted
May 26, 2026
Kind
B2
Abstract

The present invention relates in one aspect to a semiconductor device ( 10 ), comprising a substrate ( 11 ), a photonic semiconductor layer ( 12 ), a first insulator layer ( 13 ) above the photonic semiconductor layer ( 12 ), and a lens layer ( 14 ) on top of the first insulator layer ( 13 ). A method for fabricating the semiconductor device is also disclosed. The method comprises the steps of forming a substrate, forming a photonic semiconductor layer on the substrate, forming a first insulator layer above the photonic semiconductor layer, and forming a lens layer on top of the insulator layer.

Claims (19)

1 . A semiconductor device, comprising:

(a) a substrate;

(b) at least one photonic semiconductor layer;

(c) at least one first insulator layer above said photonic semiconductor layer;

(d) at least one lens layer on top of said first insulator layer, characterized in that:

said lens layer is deposited on said first insulator layer and includes at least one lens portion; and

said first insulator layer includes a cavity beneath said lens portion to suspend said lens portion.

2 . The semiconductor device of claim 1 , wherein said photonic semiconductor layer is capable of emitting an electromagnetic radiation.

3 . The semiconductor device of claim 1 , wherein said photonic semiconductor layer is capable of absorbing an electromagnetic radiation.

4 . The semiconductor device of claim 1 , wherein said semiconductor device is at least one of a photodiode, a light emitting diode, a laser diode and a photovoltaic cell.

5 . The semiconductor device of claim 1 , wherein said lens layer has refractive index within a range of 1.46-2.6.

6 . The semiconductor device of claim 1 , wherein a stack of one or more second insulator layers and dielectric layers is formed between said photonic semiconductor layer and said first insulator layer.

7 . The semiconductor device of claim 6 , wherein said second insulator layers and said dielectric layers are alternately arranged upon one another to form said stack.

8 . The semiconductor device of claim 1 , further comprises two or more electrical connectors for electrically connecting said photonic semiconductor layer to at least one external device.

9 . The semiconductor device of claim 1 , wherein said lens layer includes one or more holes around said lens portion.

10 . The semiconductor device of claim 1 , wherein said cavity has a flat bottom surface.

11 . The semiconductor device of claim 1 , wherein at least 80% of a bottom surface area of said lens portion is exposed to said cavity.

12 . The semiconductor device of claim 1 , wherein said cavity is coaxially aligned with said lens portion.

13 . The semiconductor device of claim 1 , wherein a perimeter of said cavity is at least equal to a perimeter of said lens portion.

Priority Claims (1)
SG 10202008277Y · Aug 27, 2020 · national
Continuity (1)
Related Publication 20230253518A1 · Aug 10, 2023
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