Granted Patent B2

US 12,645,151 · App. 18/279,694 · Granted Jun 2, 2026

Inventors: Bram Paul Theodoor Van Goch (Maarheeze, NL); Johan Gertrudis Cornelis Kunnen (Weert, NL); Sae Na Na (Norwalk, CT)

Assignee: ASML Netherlands B.V.

G03F7/70508G03F1/84G03F7/7065

Abstract

Claims (50)

1 . A method, comprising:

detecting data associated with a patterning device and/or a lithographic apparatus comprising detecting one or more indicators associated with a patterning device defect, the patterning device defect comprising a patterning device load condition associated with a defective patterning device clamp;

performing an evaluation test based on the data;

determining whether to proceed with exposing a substrate based on the evaluation test;

selecting, using a processor, an action from a plurality of actions based on the one or more indicators in response to a determination not to proceed, the plurality of actions comprising at least one of a patterning device puff and a patterning device reload onto a support structure; and

performing the action on the patterning device and/or the lithographic apparatus.

2 . The method of claim 1 , wherein detecting the data associated with the patterning device and/or the lithographic apparatus comprises detecting one or more indicators associated with a patterning device and/or a lithographic apparatus defect.

3 . The method of claim 2 , wherein:

selecting the action from the plurality of actions is based on the detected one or more indicators; and/or

the patterning device and/or lithographic apparatus defect is a reticle load condition.

4 . The method of claim 1 , wherein:

detecting the data associated with the patterning device and/or the lithographic apparatus comprises measuring alignment data;

performing the evaluation test comprises comparing the measured alignment data to an alignment threshold; and

determining whether to proceed with exposing the substrate based on the evaluation test comprises determining whether the measured alignment data exceeds the alignment threshold.

5 . The method of claim 1 , further comprising:

repeating the detection of data associated with the patterning device and/or the lithographic apparatus after the selected action is performed.

6 . The method of claim 1 , wherein the plurality of actions includes at least one of a patterning device puff, a patterning device reload onto the support sturcture, and a patterning device reject.

7 . The method of claim 1 , wherein:

performing the evaluation test based on the data comprises comparing the detected data to a threshold;

detecting the data associated with the patterning device and/or the lithographic apparatus comprises detecting data from a sensor; and

the data detected from the sensor includes at least one of temperature data, a clamp time data, and/or pressure data associated with the patterning device.

8 . The method of claim 1 , further comprising:

determining previous evaluation test results associated with the patterning device and/or the lithography apparatus;

identifying a trend based on the previous evaluation test results and the evaluation test; and

selecting the action based on the trend, wherein the selected action is a patterning device reject when the trend is indicative of a defect in the patterning device.

9 . A lithography apparatus comprising:

an illumination system configured to illuminate a pattern of a patterning device;

a projection system configured to project an image of the pattern onto a substrate; and

a metrology system comprising a processor, the processor being configured to:

receive data associated with the patterning device and/or the lithographic apparatus, wherein the data associated with the patterning device and/or the lithographic apparatus comprises one or more indicators associated with a patterning device defect, and the patterning device defect comprises a patterning device load condition associated with a defective patterning device clamp;

perform an evaluation test based on the data;

determine whether to proceed with exposing the substrate based on the evaluation test;

select an action from a plurality of actions based on the one or more indicators when a determination not to proceed is made, wherein the plurality of actions comprises at least one of a patterning device puff and a patterning device reload onto a support structure; and

send a signal to perform the action on the patterning device and/or the lithographic apparatus.

10 . The lithography apparatus of claim 9 , wherein receiving data associated with the patterning device and/or the lithographic apparatus comprises detecting one or more indicators associated a patterning device and/or a lithographic apparatus defect.

11 . The lithography apparatus of claim 10 , wherein:

selecting the action from the plurality of actions is based on the detected one or more indicators; and/or

the patterning device and/or lithographic apparatus defect is a reticle load condition.

12 . The lithography apparatus of claim 9 , wherein the plurality of actions includes at least one of a patterning device puff, a patterning device reload onto the support structure, and a patterning device reject.

13 . The lithography apparatus of claim 9 , wherein the processor is further configured to receive data from a sensor, wherein the data received from the sensor includes at least one of temperature data, clamp time data, and/or pressure data associated with the patterning device.

14 . The lithography apparatus of claim 9 , wherein the processor is further configured to:

determine previous evaluation test results associated with the patterning device and/or the lithography apparatus;

identify a trend based on the previous evaluation test results and the evaluation test; and

select the action based on the trend.

15 . A computer-readable storage medium having instructions stored thereon, execution of which by one or more processors cause the one or more processors to perform operations, the operations comprising:

receiving data associated with a patterning device and/or a lithographic apparatus, the data associated with the patterning device and/or the lithographic apparatus comprising one or more indicators associated with a patterning device defect, and the patterning device defect comprises a patterning device load condition associated with a defective patterning device clamp;

performing an evaluation test based on the data;

determining whether to proceed with exposing a substrate based on the evaluation test;

selecting an action from a plurality of actions based on the one or more indicators when a determination not to proceed is made, the plurality of actions comprising at least one of a patterning device puff and a patterning device reload onto a support structure; and

sending a signal to perform the action on the patterning device and/or a lithographic apparatus.

Assignments (2)

Continuity (3)

References Cited (29)