Semiconductor bonding tool and method of operating the same
A bag is filled with liquid, instead of an airbag filled with gas, to deform a bottom wafer toward a top wafer during a wafer bonding process. As a result, the liquid is less susceptible to temperature changes, which reduces run-out variation across wafer bonding processes. Reducing run-out variation conserves wasted wafers by increasing yield and reducing a quantity of non-functioning devices that are produced. Additionally, in some implementations, the liquid may be pre-heated before the bag is filled with the liquid. As a result, the bottom wafer (and, to some extent, the top wafer) experiences some thermal deformation and less mechanical deformation, which further increases yield and reduces a quantity of non-functioning devices that are produced.
1 . A device, comprising:
a bag configured to adhere to a chuck base on a bottom side and configured to support a wafer on a top side,
wherein, when filled with a liquid, an inner volume of the bag expands and causes deformation of the wafer on the top side, and
wherein the bag has an outer circumference, at least one first inner circumference surrounding a first conduit extending through an entirety of the bag, and at least one second inner circumference surrounding a loading pin, wherein the first conduit is configured to remove air between the bag and the wafer.
2 . The device of claim 1 ,
wherein the bag is adapted to be filled with a hydraulic oil.
3 . The device of claim 1 ,
wherein the at least one first inner circumference comprises at least one first seam, and the at least one second inner circumference comprises at least one second seam.
4 . The device of claim 1 ,
wherein the bag comprises a single piece of extruded metal.
5 . The device of claim 1 , further comprising:
at least one port that is connectable to at least one second conduit configured to provide the liquid to fill the bag.
6 . The device of claim 1 ,
wherein the bag further includes at least one opening that is fused to at least one second conduit configured to provide the liquid to fill the bag.
7 . A method, comprising:
generating, via a conduit, a vacuum between a bag and a first wafer to remove air to adhere the first wafer to the bag, wherein the first conduit extends through an entirety of the bag;
applying, after generating the vacuum, a force to a second wafer to deform the second wafer toward the first wafer; and
filling, after applying the force, the bag with a liquid to deform the first wafer toward the second wafer.
8 . The method of claim 7 ,
wherein filling the bag with the liquid comprises:
filling the bag with the liquid that has a coefficient of compressibility in a range from approximately 2·10 −9 Pa −1 to approximately 7·10 −10 Pa −1 .
9 . The method of claim 7 ,
wherein filling the bag with the liquid comprises:
filling the bag with the liquid that has a specific heat capacity in a range from approximately 1.5 J/g(° C.) to approximately 5 J/g(° C.).
10 . The method of claim 7 ,
wherein filling the bag with the liquid comprises:
pre-heating the liquid to at least 45° Celsius; and
filling the bag with the pre-heated liquid.
11 . The method of claim 7 , further comprising:
determining that the first wafer is bonded to the second wafer; and
removing the liquid from the bag based on determining that the first wafer is bonded to the second wafer.
12 . The method of claim 11 , further comprising:
refraining from applying the force to the second wafer based on determining that the first wafer is bonded to the second wafer.
13 . A system, comprising:
a top chuck configured to support a first wafer;
a pin configured to deform the first wafer toward a second wafer;
a bottom chuck configured to support the second wafer;
a bag filled with a liquid configured to deform the second wafer toward the first wafer while a perimeter of the bag remains in contact with a perimeter of the bottom chuck; and
a pipe configured to generate a vacuum, between the second wafer and the bag, to remove air, wherein the pipe passes through an entirety of the bag.
14 . The system of claim 13 , further comprising:
at least one conduit configured to provide the liquid to fill the bag.
15 . The system of claim 14 ,
wherein the at least one conduit is further configured to remove the liquid from the bag after the first wafer and the second wafer are bonded.
16 . The system of claim 13 , further comprising:
a heater configured to pre-heat the liquid used to fill the bag.
17 . The system of claim 13 , further comprising:
a controller configured to transmit a command to generate the vacuum before the bag is filled with the liquid.
18 . The system of claim 17 ,
wherein the controller is further configured to transmit a command to fill the bag with the liquid.
19 . The system of claim 13 , further comprising:
a controller configured to determine that the first wafer and the second wafer are bonded and to transmit a command to remove the liquid from the bag.
20 . The system of claim 19 ,
wherein the controller is further configured to transmit a command to refrain from generating the vacuum.