Contour extraction method from inspection image in multiple charged-particle beam inspection
An improved apparatus and method for extracting pattern contour information from an inspection image in a multiple charged-particle beam inspection system are disclosed. An improved method for extracting pattern contour information from an inspection image comprises identifying, from an inspection image obtained from a charged-particle beam inspection system, a first pattern and a second pattern that partially overlap in the inspection image. The method also comprises generating a first separation image by removing an image area corresponding to the second pattern from the inspection image. The first separation image includes the first pattern of which a first part is removed when removing the image area corresponding to the second pattern. The method also comprises updating the first separation image to include image data representing the removed first part of the first pattern based on a first reference image corresponding to the first pattern.
1 . A method for extracting pattern contour information from an inspection image, the method comprising:
identifying, from an inspection image obtained from a charged-particle beam inspection system, a first pattern and a second pattern that partially overlap in the inspection image, wherein the first pattern and the second pattern are structures on a sample;
generating a first separation image by:
superimposing, on the inspection image, a second reference image on the second pattern, wherein the second reference image corresponds to the second pattern; and
removing an image area corresponding to the second pattern from the inspection image, wherein the first separation image includes the first pattern of which a first part is removed when removing the image area corresponding to the second pattern; and
updating the first separation image to include image data representing the removed first part of the first pattern based on a first reference image corresponding to the first pattern.
2 . A contour extraction apparatus comprising:
a memory storing a set of instructions; and
at least one processor configured to execute the set of instructions to cause the apparatus to perform:
identifying, from an inspection image obtained from a charged-particle beam inspection system, a first pattern and a second pattern that partially overlap in the inspection image, wherein the first pattern and the second pattern are structures on a sample;
generating a first separation image by:
superimposing, on the inspection image, a second reference image on the second pattern, wherein the second reference image corresponds to the second pattern; and
removing an image area corresponding to the second pattern from the inspection image, wherein the first separation image includes the first pattern of which a first part is removed when removing the image area corresponding to the second pattern; and
updating the first separation image to include image data representing the removed first part of the first pattern based on a first reference image corresponding to the first pattern.
3 . The apparatus of claim 2 , the at least one processor is configured to execute the set of instructions to cause the apparatus to further perform:
extracting contour information of the first pattern from the updated first separation image.
4 . The apparatus of claim 2 , wherein updating the first separation image is performed by filling the first part in the first separation image using an inpainting algorithm.
5 . The apparatus of claim 2 , wherein identifying the first pattern and the second pattern comprises:
extracting, from the inspection image, a first image patch covering a portion of the first pattern, wherein the portion of the first pattern is nonoverlapping with the second pattern;
extracting, from the inspection image, a second image patch covering a portion of the second pattern, wherein the portion of the second pattern is nonoverlapping with the first pattern; and
associating the first image patch with the first reference image and the second image patch with a second reference image corresponding to the second pattern.
6 . The apparatus of claim 5 , wherein associating the first image patch with the first reference image and the second image patch with the second reference image is performed by using the first image patch and the second image patch as inputs to a machine learning model.
7 . The apparatus of claim 2 , wherein identifying the first pattern and the second pattern is performed in real time.
8 . The apparatus of claim 2 , wherein generating the first separation image comprises:
superimposing, on the inspection image, the first reference image on the first pattern; and
removing the image area corresponding to the second pattern based on the second reference image superimposed on the second pattern.
9 . The apparatus of claim 2 , wherein the first reference image is in Graphic Database System (GDS) format, Graphic Database System II (GDS II) format, Open Artwork System Interchange Standard (OASIS) format, or Caltech Intermediate Format (CIF).
10 . A non-transitory computer readable medium that stores a set of instructions that is executable by at least one processor of a computing device to cause the computing device to perform a method for extracting pattern contour information from an inspection image, the method comprising:
identifying, from an inspection image obtained from a charged-particle beam inspection system, a first pattern and a second pattern that partially overlap in the inspection image, wherein the first pattern and the second pattern are structures on a sample;
generating a first separation image by:
superimposing, on the inspection image, a second reference image on the second pattern, wherein the second reference image corresponds to the second pattern; and
removing an image area corresponding to the second pattern from the inspection image, wherein the first separation image includes the first pattern of which a first part is removed when removing the image area corresponding to the second pattern;
updating the first separation image to include image data representing the removed first part of the first pattern based on a first reference image corresponding to the first pattern.
11 . The non-transitory computer readable medium of claim 10 , the set of instructions that is executable by at least one processor of the computing device to cause the computing device to further perform:
extracting contour information of the first pattern from the updated first separation image.
12 . The non-transitory computer readable medium of claim 10 , wherein updating the first pattern in the first separation image is performed by filling the first part in the first separation image using an inpainting algorithm.
13 . The non-transitory computer readable medium of claim 10 , wherein identifying the first pattern and the second pattern comprises:
extracting, from the inspection image, a first image patch covering a portion of the first pattern, wherein the portion of the first pattern is nonoverlapping with the second pattern;
extracting, from the inspection image, a second image patch covering a portion of the second pattern, wherein the portion of the second pattern is nonoverlapping with the first pattern; and
associating the first image patch with the first reference image and the second image patch with a second reference image corresponding to the second pattern.
14 . The non-transitory computer readable medium of claim 13 , wherein associating the first image patch with the first reference image and the second image patch with the second reference image is performed by using the first image patch and the second image patch as inputs to a machine learning model.
15 . The non-transitory computer readable medium of claim 10 , wherein identifying the first pattern and the second pattern is performed in real time.