Filtering device, purification device, and method for manufacturing chemical liquid
A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified, and the filtering device has an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path which includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion, in which the filter A is a porous membrane containing a polyimide-based resin.
1 . A filtering device for obtaining a chemical liquid by purifying a liquid to be purified, the filtering device comprising:
an inlet portion;
an outlet portion;
a filter A;
at least one filter B different from the filter A; and
a flow path which includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion,
wherein the filter A is a porous membrane containing a polyimide-based resin,
the filter B includes at least one filter BU that is disposed on an upstream side of the filter A on the flow path and has a pore size larger than a pore size of the filter A,
the filter B includes at least one filter BD that is disposed on a downstream side of the filter A on the flow path and has a pore size smaller than a pore size of the filter A,
the at least one filter BU includes a filter having a pore size equal to or greater than 50 nm and equal to or smaller than 200 nm and a filter containing a resin having an ion exchange group,
the filter having a pore size equal to or greater than 50 nm and equal to or smaller than 200 nm is disposed on the upstream side of the filter containing a resin having an ion exchange group, and
the filter having a pore size equal to or greater than 50 nm and equal to or smaller than 200 nm, the filter containing a resin having an ion exchange group, the filter A and the filter BD are arranged in series.
2 . The filtering device according to claim 1 ,
wherein an imidization ratio of the polyimide-based resin is equal to or higher than 1.0.
3 . The filtering device according to claim 1 ,
wherein the pore size of the filter BD is equal to or smaller than 20 nm.
4 . The filtering device according to claim 1 ,
wherein the filter BD contains at least one kind of resin selected from the group consisting of polyethylene, nylon, and polytetrafluoroethylene.
5 . The filtering device according to claim 1 ,
wherein the filter BD contains a second resin having a hydrophilic group.
6 . The filtering device according to claim 1 ,
wherein the ion exchange group is at least one kind of group selected from the group consisting of an acid group and a base group.
7 . The filtering device according to claim 1 , further comprising:
a tank arranged in series with the filter A on the flow path.
8 . The filtering device according to claim 7 , further comprising:
a filter C which is arranged in series with the tank on an upstream side of the tank in the flow path and has a pore size equal to or smaller than 20 nm.
9 . The filtering device according to claim 1 , further comprising:
a return flow path capable of returning the liquid to be purified to an upstream side of the filter A from a downstream side of the filter A on the flow path.
10 . The filtering device according to claim 3 , further comprising:
a return flow path capable of returning the liquid to be purified to an upstream side of a reference filter from a downstream side of the reference filter,
wherein the reference filter consists of any of the at least one of the filters BD.
11 . The filtering device according to claim 1 ,
wherein the chemical liquid is at least one kind of chemical liquid selected from the group consisting of a developer, a rinsing solution, a wafer washing solution, a line washing solution, a prewet solution, a wafer rinsing solution, a resist solution, a solution for forming an underlayer film, a solution for forming an overlayer film, and a solution for forming a hardcoat, or at least one kind of chemical liquid selected from the group consisting of an aqueous developer, an aqueous rinsing solution, a peeling solution, a remover, an etching solution, an acidic washing solution, and a phosphoric acid, and a phosphoric acid-aqueous hydrogen peroxide mixture.
12 . The filtering device according to claim 1 ,
wherein a pH of the chemical liquid is 0 to 9.
13 . A method for manufacturing a chemical liquid by purifying a liquid to be purified, comprising:
a filtration step of purifying the liquid to be purified by using a filtering device so as to obtain a chemical liquid,
wherein the filtering device comprising:
an inlet portion;
an outlet portion;
a filter A;
at least one filter B different from the filter A; and
a flow path which includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion,
the filter A is a porous membrane containing a polyimide-based resin, and
the filter B includes at least one filter BU that is disposed on an upstream side of the filter A on the flow path and has a pore size larger than a pore size of the filter A,
the filter B includes at least one filter BD that is disposed on a downstream side of the filter A on the flow path and has a pore size smaller than a pore size of the filter A,
the at least one filter BU includes a filter having a pore size equal to or greater than 50 nm and equal to or smaller than 200 nm and a filter containing a resin having an ion exchange group,
the filter having a pore size equal to or greater than 50 nm and equal to or smaller than 200 nm is disposed on the upstream side of the filter containing a resin having an ion exchange group, and
the filter having a pore size equal to or greater than 50 nm and equal to or smaller than 200 nm, the filter containing a resin having an ion exchange group, the filter A and the filter BD are arranged in series, and
the chemical liquid is a resist solution.
14 . The method for manufacturing a chemical liquid according to claim 13 ,
wherein the resist solution contains a resin, and
the resin contains a repeating unit having lactone structure.
15 . The method for manufacturing a chemical liquid according to claim 13 ,
wherein the resist solution contains a resin, and
the resin contains a repeating unit having hydroxystyrene structure.
16 . The method for manufacturing a chemical liquid according to claim 13 ,
wherein the resist solution contains a resin and a hydrophobic resin.
17 . The method for manufacturing a chemical liquid according to claim 13 ,
wherein the filtration step is a circulation filtration step.
18 . The method for manufacturing a chemical liquid according to claim 13 ,
wherein the filter A and the filter B are used after being immersed in a solvent.
19 . The method for manufacturing a chemical liquid according to claim 13 ,
wherein an imidization ratio of the polyimide-based resin is equal to or higher than 1.0.