Epitaxially grown nitride-based compound semiconductor crystal substrate structure with low dislocation density
View Patent ↗A metal layer is formed directly on a nitride-based compound semiconductor base layer over a substrate body. The metal layer includes at least one metal exhibiting an atomic interaction, with assistance of a heat treatment, to atoms constituting the base layer to promote removal of constitutional atoms from the base layer, whereby pores penetrating the metal layer are formed, while many voids are formed in the nitride-based compound semiconductor base layer. An epitaxial growth of a nitride-based compound semiconductor crystal is made with an initial transient epitaxial growth, which fills the voids, and a subsequent main epitaxial growth over the porous metal layer.
1. An epitaxially grown nitride-based compound semiconductor crystal substrate structure, comprising:
a nitride-based compound semiconductor base layer having voids;
a metal layer on said nitride-based compound semiconductor base layer, said metal layer including at least one selected from the group consisting of metals, a nitride of which has a lower free energy than a free energy of said nitride-based compound semiconductor base layer, said metal layer having pores; and
an epitaxially grown nitride-based compound semiconductor crystal layer over said metal layer and within said pores and said voids,
wherein said epitaxially grown nitride-based compound semiconductor crystal layer is lower in dislocation density than said nitride-based compound semiconductor base layer.
2. The structure as claimed in claim 1 , wherein said voids have an averaged depth of not less than 10 nanometers.
3. The structure as claimed in claim 1 , wherein said voids are formed at a porosity rate in the range of 10% to 90%.
4. The structure as claimed in claim 1 , wherein said nitride-based compound semiconductor is a gallium nitride-based compound semiconductor including gallium and nitrogen.
5. The structure as claimed in claim 1 , wherein said epitaxially grown nitride-based compound semiconductor crystal includes a surface region which has a dislocation density of 1E8 cm −2 or less.
6. The structure as claimed in claim 5 , wherein said surface region of said epitaxially grown nitride-based compound semiconductor crystal has a surface planarity within ±0.2 micrometers in a length order of 500 micrometers.
7. The structure as claimed in claim 5 , wherein, of said surface region of said epitaxially grown nitride-based compound semiconductor crystal, a full width at half maximum of a (0002)-diffraction rocking curve and another full width at half maximum of a (10-10)-diffraction rocking curve are both at most 0.1 degree respectively.
8. The structure as claimed in claim 1 , wherein said surface region of said epitaxially grown nitride-based compound semiconductor crystal has a C-plane.
9. The structure as claimed in claim 8 , wherein said nitride-based compound semiconductor base layer has a surface generally oriented to [0001], and said metal layer has a hexagonal crystal structure generally oriented to [0001].
10. The structure as claimed in claim 8 , wherein said nitride-based compound semiconductor base layer has a surface generally oriented to [0001], and said metal layer has a cubic crystal structure generally oriented to [111].
11. The structure as claimed in claim 1 , further comprising:
a crystal supporting substrate underlying said nitride-based compound semiconductor base layer.
12. The structure as claimed in claim 11 , further comprising:
a dielectric mask pattern over a crystal supporting substrate and under said nitride-based compound semiconductor base layer.
13. The structure as claimed in claim 11 , further comprising:
a dielectric mask pattern over said epitaxially grown nitride-based compound semiconductor crystal over said metal layer; and
a nitride-based compound semiconductor crystal top layer over said dielectric mask pattern.
14. A single layered substrate structure comprising an epitaxially grown nitride-based compound semiconductor crystal, wherein,
said epitaxially grown nitride-based compound semiconductor crystal includes a surface region which has a dislocation density of 1E8 cm −2 or less, and
said surface region of said epitaxially grown nitride-based compound semiconductor crystal has a surface planarity within ±0.2 micrometers in a length order of 500 micrometers.
15. A single layered substrate structure comprising an epitaxially grown nitride-based compound semiconductor crystal, wherein,
said epitaxially grown nitride-based compound semiconductor crystal includes a surface region which has a dislocation density of 1E8 cm −2 or less, and
of said surface region of said epitaxially grown nitride-based compound semiconductor crystal, a full width at half maximum of a (0002)-diffraction rocking curve and another full width at half maximum of a (10-10)-diffraction rocking curve are both at most 0.1 degree respectively.
16. An epitaxially grown nitride-based compound semiconductor crystal substrate structure, comprising:
a nitride-based compound semiconductor base layer having voids;
a metal layer on said nitride-based compound semiconductor base layer, said metal layer including at least one selected from the group consisting of metals, a nitride of which has a lower free energy than a free energy of said nitride-based compound semiconductor base layer, said metal layer having pores; and
an epitaxially grown nitride-based compound semiconductor crystal layer over said metal layer and filling said pores and said voids,
wherein said epitaxially grown nitride-based compound semiconductor crystal layer is lower in dislocation density than said nitride-based compound semiconductor base layer.