IP Library Assignment 038431/0753
Patent Assignment
Reel/Frame 038431/0753

Assignment of Assignor's Interest

Recorded: 2016-05-02 Pages: 2
Assignor
NEC CORPORATION
Executed: 2016-02-26
Assignee
SCIOCS COMPANY LIMITED
880 ISAGOZAWA-CHO, HITACHI-SHI, IBARAKI-KEN, JAPAN
Covered Properties (2)
Method of Forming an Epitaxially Grown Nitride-Based Compound Semiconductor Crystal Substrate Structure and the Same Substrate Structure
Patent: 6,812,051 →
Application: 10/150,960 →
Publication: US 2003/0017685
Epitaxially Grown Nitride-Based Compound Semiconductor Crystal Substrate Structure with Low Dislocation Density
Patent: 7,196,399 →
Application: 10/939,404 →
Publication: US 2005/0029507
Related Assignments (5)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest May 21, 2002
From: USUI, AKIRA; SHIBATA, MASATOMO; OSHIMA, YUICHI
To: NEC CORPORATION; HITACHI CABLE, LTD.
Reel/Frame 012926/0744 →
Merger Jan 14, 2015
From: HITACHI CABLE, LTD.
To: HITACHI METALS, LTD.
Reel/Frame 034757/0313 →
Assignment of Assignor's Interest Jul 13, 2015
From: USUI, AKIRA; SHIBATA, MASATOMO; OSHIMA, YUICHI
To: NEC CORPORATION; HITACHI CABLE, LTD.
Reel/Frame 036098/0290 →
Assignment of Assignor's Interest Nov 3, 2015
From: HITACHI METALS, LTD.
To: SCIOCS COMPANY LIMITED
Reel/Frame 036941/0655 →
Assignment of Assignor's Interest May 3, 2016
From: SCIOCS COMPANY LIMITED
To: SUMITOMO CHEMICAL CO., LTD.
Reel/Frame 038444/0891 →