Laser gas replenishment method
Output beam parameters of a gas discharge laser are stabilized by maintaining a molecular fluorine component at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is subject to depletion within the discharge chamber. Gas injections including molecular fluorine can increase the partial pressure of molecular fluorine by a selected amount. The injections can be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure. The amount per injection and/or the interval between injections can be varied, based on factors such as driving voltage and a calculated amount of molecular fluorine in the discharge chamber. The driving voltage can be in one of multiple driving voltage ranges that are adjusted based on system aging. Within each range, gas injections and gas replacements can be performed based on, for example, total applied electrical energy or time/pulse count.
1. A gas discharge laser system, comprising:
a discharge chamber containing a laser gas mixture including a constituent gas which is subject to depletion;
a plurality of electrodes connected to a power supply circuit for providing a driving voltage to said electrodes as a pulsed discharge to energize said laser gas mixture;
a resonator surrounding said discharge chamber for generating a pulsed laser beam;
a gas supply unit connected to said discharge chamber; and
a processor for controlling gaseous flow between said gas supply unit and said discharge chamber, the processor configured to control the gas supply unit to inject a selected amount of constituent gas into said discharge chamber at selected intervals, at least one of the selected intervals and the selected amount of each constituent gas injection depending upon an amount of input electrical energy applied to the pulsed discharge in the laser gas mixture;
wherein the selected amount of the constituent gas injection for at least one of the selected intervals is between 0.0001 mbar and 0.2 mbar of said constituent gas or between 0.003% and 7% of said constituent gas presently within said discharge chamber.
2. A system according to claim 1 , further comprising:
a counter in communication with the processor and operable to store an accumulated total for the amount of input electrical energy applied to the pulsed discharge.
3. A system according to claim 1 , wherein:
the processor is configured to inject one of a plurality of selected amounts of constituent gas at each interval, the timing between intervals being further dependent upon the selected amount of constituent gas.
4. A system according to claim 1 , wherein:
at least one of the selected intervals and the amount of each constituent gas injection is further dependent upon at least one parameter selected from the group consisting of: the aging of at least one component of the laser system, a calculated amount of the constituent gas in the gas mixture after a previous injection, a measured pressure in an accumulator from which constituent gas was previously injected, and a measured temperature in one of said accumulator and said discharge chamber.
5. A method for controlling a composition of a gas mixture within a discharge chamber of a gas discharge laser system, comprising the steps of:
monitoring an amount of input electrical energy applied to a pulsed discharge in the gas mixture;
determining an amount of constituent gas to be injected into said discharge chamber based on the amount of input electrical energy applied to the pulsed discharge, the amount of constituent gas to be injected for at least one amount of input electrical energy being between 0.0001 mbar and 0.2 mbar of said constituent gas or between 0.003% and 7% of said constituent gas presently within said discharge chamber;
selecting an interval at which to inject the constituent gas into said discharge chamber, the interval being dependent upon the amount of constituent gas; and
injecting said amount of said constituent gas into said discharge chamber at the selected interval.
6. A method according to claim 5 , further comprising:
monitoring a second parameter indicative of the concentration of a constituent gas in the gas mixture.
7. A method according to claim 6 , wherein:
the second parameter is selected from the group consisting of: the aging of at least one component of the laser system, a calculated amount of the constituent gas in the gas mixture after a previous injection, a measured pressure in an accumulator from which constituent gas was previously injected, and a measured temperature in one of said accumulator and said discharge chamber.
8. A method according to claim 7 , wherein:
at least one of the amount of constituent gas to be injected and the interval at which to inject the constituent gas is further determined using the second parameter.
9. A gas discharge laser system, comprising:
a discharge chamber containing a laser gas mixture including a constituent gas which is subject to depletion;
a plurality of electrodes connected to a power supply circuit for providing a driving voltage to said electrodes as a series of pulsed discharges to energize said laser gas mixture;
a resonator surrounding said discharge chamber for generating a pulsed laser beam;
a gas supply unit connected to said discharge chamber; and
a processor for controlling gaseous flow between said gas supply unit and said discharge chamber, the processor configured to control the gas supply unit to inject an amount of constituent gas into said discharge chamber at selected intervals, at least one of the selected intervals and the amount of each constituent gas injection depending upon the number of pulsed discharges in the laser gas mixture,
wherein the amount of the constituent gas injection for at least one of the selected intervals is between 0.0001 mbar and 0.2 mbar of said constituent gas or between 0.003% and 7% of said constituent gas presently within said discharge chamber.
10. A system according to claim 9 , wherein:
a counter in communication with the processor and operable to store the number of pulsed discharges in the laser gas mixture.
11. A system according to claim 9 , wherein:
the processor is configured to inject one of a plurality of selected amounts of constituent gas at each interval, the timing between intervals being further dependent upon the selected amount of constituent gas.
12. A system according to claim 9 , wherein:
at least one of the selected intervals and the amount of each constituent gas injection is further dependent upon at least one parameter selected from the group consisting of: the aging of at least one component of the laser system, a calculated amount of the constituent gas in the gas mixture after a previous injection, a measured pressure in an accumulator from which constituent gas was previously injected, and a measured temperature in one of said accumulator and said discharge chamber.
13. A method for controlling a composition of a gas mixture within a discharge chamber of a gas discharge laser system, comprising the steps of:
monitoring a number of pulsed discharges in the gas mixture;
determining an amount of constituent gas to be injected into said discharge chamber based on the number of pulsed discharges;
selecting an interval at which to inject the constituent gas into said discharge chamber, the interval being dependent upon the amount of constituent gas; and
injecting said amount of said constituent gas into said discharge chamber at the selected interval, the amount of said constituent gas for at least one selected interval being between 0.0001 mbar and 0.2 mbar of said constituent gas or between 0.003% and 7% of said constituent gas presently within said discharge chamber.
14. A method according to claim 13 , wherein:
monitoring a second parameter indicative of the concentration of a constituent gas in the gas mixture.
15. A method according to claim 14 , wherein:
the second parameter is selected from the group consisting of: the aging of at least one component of the laser system, a calculated amount of the constituent gas in the gas mixture after a previous injection, a measured pressure in an accumulator from which constituent gas was previously injected, and a measured temperature in one of said accumulator and said discharge chamber.
16. A method according to claim 15 , wherein:
at least one of the amount of constituent gas to be injected and the interval at which to inject the constituent gas is further determined using the second parameter.
17. A gas discharge laser system, comprising:
a discharge chamber containing a laser gas mixture including a constituent gas which is subject to depletion;
a plurality of electrodes connected to a power supply circuit for providing a driving voltage to said electrodes as a pulsed discharge to energize said laser gas mixture;
a resonator surrounding said discharge chamber for generating a pulsed laser beam;
a gas supply unit connected to said discharge chamber; and
a processor for controlling gaseous flow between said gas supply unit and said discharge chamber, the processor configured to control the gas supply unit to inject an amount of constituent gas into said discharge chamber at selected intervals, at least one of the selected intervals and the amount of each constituent gas injection depending upon an operation mode of the gas discharge laser system,
wherein the depletion rate of the constituent gas in the laser gas mixture varies with operation mode, and
wherein the amount of constituent gas for at least one of the selected intervals is between 0.0001 mbar and 0.2 mbar of said constituent gas or between 0.003% and 7% of said constituent gas presently within said discharge chamber.
18. A system according to claim 17 , wherein:
the processor is configured to inject one of a plurality of selected amounts of constituent gas at each interval, the timing between intervals being further dependent upon the selected amount of constituent gas.
19. A system according to claim 17 , wherein:
at least one of the selected intervals and the amount of each constituent gas injection is further dependent upon at least one parameter selected from the group consisting of: the aging of at least one component of the laser system, a calculated amount of the constituent gas in the gas mixture after a previous injection, a measured pressure in an accumulator from which constituent gas was previously injected, and a measured temperature in one of said accumulator and said discharge chamber.
20. A method for controlling a composition of a gas mixture within a discharge chamber of a gas discharge laser system, comprising the steps of:
monitoring an operation mode of the gas discharge laser system, wherein a depletion rate of a constituent gas in the gas mixture varies with operation mode;
determining an amount of constituent gas to be injected into said discharge chamber based on the am operation mode of the gas discharge laser system;
selecting an interval at which to inject the amount of constituent gas into said discharge chamber, the interval being dependent upon the amount of constituent gas; and
injecting said amount of said constituent gas into said discharge chamber at the selected interval, the amount of said constituent gas for at least one selected interval being between 0.0001 mbar and 0.2 mbar of said constituent gas or between 0.003% and 7% of said constituent gas presently within said discharge chamber.
21. A method according to claim 20 , wherein:
monitoring a second parameter indicative of the concentration of a constituent gas in the gas mixture.
22. A method according to claim 20 , wherein:
the second parameter is selected from the group consisting of: the aging of at least one component of the laser system, a calculated amount of the constituent gas in the gas mixture after a previous injection, a measured pressure in an accumulator from which constituent gas was previously injected, and a measured temperature in one of said accumulator and said discharge chamber.
23. A method according to claim 22 , wherein:
at least one of the amount of constituent gas to be injected and the interval at which to inject the constituent gas is further determined using the second parameter.
24. A gas discharge laser system, comprising:
a discharge chamber containing a laser gas mixture including first and second constituent gases, each of the first and second constituent gases being subject to depletion;
a plurality of electrodes connected to a power supply circuit for providing a driving voltage to said electrodes as a pulsed discharge to energize said laser gas mixture;
a resonator surrounding said discharge chamber for generating a pulsed laser beam;
a gas supply unit connected to said discharge chamber;
a processor for controlling gaseous flow between said gas supply unit and said discharge chamber, the processor configured to control the gas supply unit to inject a first amount of the first constituent gas into said discharge chamber at one of a first selected interval and to inject a second amount of the second constituent gas into said discharge chamber at a second selected interval; and
a database in communication with the processor and operable to store information about the first and second constituent gases under different operating conditions of the gas discharge laser system, whereby the processor can access this information to determine values to be used for at least one of the first amount and first interval and at least one of the second amount and second interval at a present operating condition of the laser system,
wherein the first amount for at least one of the first intervals is between 0.0001 mbar and 0.2 mbar of said first constituent gas or between 0.003% and 7% of said first constituent gas presently within said discharge chamber, and
wherein the second amount for at least one of the second intervals is between 0.0001 mbar and 0.2 mbar of said second constituent gas or between 0.003% and 7% of said second constituent gas presently within said discharge chamber.
25. A method for controlling a composition of a gas mixture within a discharge chamber of a gas discharge laser system, comprising the steps of:
monitoring an operating condition of the gas discharge laser system;
accessing a database to determine a first amount of a first constituent gas and a second amount of a second constituent gas to be injected into said discharge chamber, the determined first and second amounts being dependent upon the operating condition of the gas discharge laser system;
accessing the database to determine a first interval at which to inject the first constituent gas and a second interval at which to inject the second constituent gas into said discharge chamber, the determined first and second intervals being dependent upon the operating condition of the gas discharge laser system; and
injecting said first amount of said first constituent gas and said second amount of said second constituent gas into said discharge chamber at the respective first and second intervals,
wherein the first amount for at least one of the first intervals is between 0.0001 mbar and 0.2 mbar of said first constituent gas or between 0.003% and 7% of said first constituent gas presently within said discharge chamber, and
wherein the second amount for at least one of the second intervals is between 0.0001 mbar and 0.2 mbar of said second constituent gas or between 0.003% and 7% of said second constituent gas presently within said discharge chamber.
26. A method according to claim 25 , wherein:
monitoring a second parameter indicative of the concentration of a constituent gas in the gas mixture.
27. A method according to claim 25 , wherein:
the second parameter is selected from the group consisting of: the aging of at least one component of the laser system, a calculated amount of the constituent gas in the gas mixture after a previous injection, a measured pressure in an accumulator from which constituent gas was previously injected, and a measured temperature in one of said accumulator and said discharge chamber.
28. A method according to claim 27 , wherein:
at least one of the amount of constituent gas to be injected and the interval at which to inject the constituent gas is further determined using the second parameter.