IP Library Assignment 024898/0109
Patent Assignment
Reel/Frame 024898/0109

Change of Name

Recorded: 2010-08-27 Pages: 9
Assignor
LAMBDA PHYSIK AG
Executed: 2000-06-09
Assignee
COHERENT LAMBDA PHYSIK GMBH
HANS-BOECKLER-STRASSE 12, GOETTINGEN, D-37079, GERMANY
Covered Properties (64)
Laser for Generating Narrow-Band Radiation
Patent: 5,761,236 →
Application: 08/687,793 →
Precision Variable Delay Using Saturable Inductors
Patent: 6,005,880 →
Application: 08/822,451 →
Laser System and Method for Narrow Spectral Linewidth Through Wavefront Curvature Compensation
Patent: 6,061,382 →
Application: 09/073,070 →
Diode Pumped Laser with Frequency Conversion into Uv and Duv Range
Patent: 6,002,697 →
Application: 09/139,214 →
Stabilization of Angular and Lateral Laser Beam Position
Patent: 6,014,206 →
Application: 09/162,424 →
Wavelength Selector for Laser with Adjustable Angular Dispersion
Patent: 6,393,037 →
Application: 09/244,554 →
Fz (157NM) Laser Employing Neon as the Buffer Gas
Patent: 6,157,662 →
Application: 09/317,526 →
Molecular Fluorine (F2) Laser with Narrow Spectral Linewidth
Patent: 6,154,470 →
Application: 09/317,527 →
F2-Laser with Line Selection
Patent: 6,345,065 →
Application: 09/317,695 →
Performance Control System and Method for Gas Discharge Lasers
Patent: 6,212,214 →
Application: 09/379,034 →
Method and Procedure to Automatically Stabilize Excimer Laser Output Parameters
Patent: 6,490,307 →
Application: 09/447,882 →
Narrow Band Excimer or Molecular Fluorine Laser with Adjustable Bandwidth
Patent: 6,298,080 →
Application: 09/452,353 →
Discharge Unit for a High Repetition Rate Excimer or Molecular Fluorine Laser
Patent: 6,466,599 →
Application: 09/453,670 →
Very Stable Excimer Or Molecular Fluorine Laser
Patent: 6,243,405 →
Application: 09/484,818 →
Energy Monitor for F2 Molecular Fluorine Laser and Method of Energy Stabilization
Patent: 6,819,698 →
Application: 09/512,417 →
Energy Stabilized Gas Discharge Laser
Patent: 6,714,577 →
Application: 09/513,025 →
Surface Preionization for Gas Lasers
Patent: 6,456,643 →
Application: 09/532,276 →
Optical Pulse Stretching and Smoothing for Arf and F2 Lithography Excimer Lasers
Patent: 6,389,045 →
Application: 09/550,558 →
Reduction of Laser Speckle in Photolithography by Controlled Disruption of Spatial Coherence of Laser Beam
Patent: 6,898,216 →
Application: 09/574,921 →
Roof Configuration for Laser Discharge Electrodes
Patent: 6,546,036 →
Application: 09/587,996 →
Narrow Band Excimer Laser with a Prism-Grating as Line-Narrowing Optical Element
Patent: 6,795,473 →
Application: 09/602,184 →
Excimer laser with line narrowing
Patent: 6,476,987 →
Application: 09/629,256 →
Excimer or Molecular Laser with Optimized Spectral Purity
Patent: 6,785,316 →
Application: 09/640,595 →
Temperature Compensation Method for Wavemeters
Patent: 6,667,804 →
Application: 09/686,483 →
Performance control system and method for gas discharge lasers
Patent: 6,330,267 →
Application: 09/718,805 →
157 Nm Laser System and Method for Multi-Layer Semiconductor Failure Analysis
Patent: 6,795,456 →
Application: 09/733,874 →
Publication: US 2001/0030981
Laser Gas Replenishment Method
Patent: 6,389,052 →
Application: 09/734,459 →
Publication: US 2001/0012309
Tunable Laser with Stabilized Grating
Patent: 7,075,963 →
Application: 09/771,366 →
Publication: US 2002/0012374
Narrow Band Excimer or Molecular Fluorine Laser with Adjustable Bandwidth
Patent: 6,498,803 →
Application: 09/775,778 →
Publication: US 2001/0028669
Narrow Band Excimer or Molecular Fluorine Laser with Adjustable Bandwidth
Patent: 6,487,228 →
Application: 09/776,589 →
Publication: US 2001/0009560
Excimer or Molecular Fluorine Laser Having Lengthened Electrodes
Patent: 6,570,901 →
Application: 09/791,430 →
Publication: US 2002/0001330
Blower for Gas Laser
Patent: 6,847,671 →
Application: 09/823,298 →
Discharge Unit for a High Repetition Rate Excimer or Molecular Fluorine Laser
Patent: 6,414,978 →
Application: 09/826,296 →
Publication: US 2001/0030986
Discharge Unit for a High Repetition Rate Excimer or Molecular Fluorine Laser
Patent: 6,430,205 →
Application: 09/826,372 →
Publication: US 2001/0033594
Stabilization Technique for High Repetition Rate Gas Discharge Lasers
Patent: 6,834,066 →
Application: 09/838,715 →
Publication: US 2002/0012371
Electrical Excitation Circuit for a Pulsed Gas Laser
Patent: 6,862,307 →
Application: 09/858,147 →
Publication: US 2002/0015430
Precise Monitor Etalon Calibration Technique
Patent: 6,807,205 →
Application: 09/903,425 →
Wavelength Selector for Laser with Adjustable Angular Dispersion
Patent: 6,614,828 →
Application: 09/920,008 →
Gain Module for Diode-Pumped Solid State Laser and Amplifier
Patent: 6,608,852 →
Application: 09/938,329 →
Publication: US 2002/0027937
Laser System and Method for Spectral Narrowing Through Wavefront Correction
Patent: 6,801,561 →
Application: 09/960,875 →
Publication: US 2002/0057723
Resonator Optics for High Power Uv Lasers
Patent: 6,868,106 →
Application: 10/001,954 →
Resonator Arrangement for Bandwidth Control
Patent: 6,856,638 →
Application: 10/035,351 →
Publication: US 2002/0141471
Method and Apparatus for Reduction of Spectral Fluctuations
Patent: 6,792,023 →
Application: 10/112,660 →
Laser Gas Replenishment Method
Patent: 6,504,861 →
Application: 10/114,184 →
Publication: US 2002/0101901
Laser Gas Replenishment Method
Patent: 6,490,308 →
Application: 10/114,620 →
Publication: US 2002/0101902
Laser Gas Replenishment Method
Patent: 6,493,370 →
Application: 10/121,292 →
Publication: US 2002/0110174
Molecular Fluorine Laser with Intracavity Polarization Enhancer
Patent: 6,834,069 →
Application: 10/162,115 →
High Power Excimer or Molecular Fluorine Laser System
Patent: 6,768,765 →
Application: 10/163,098 →
Method and Apparatus for Compensation of Beam Property Drifts Detected by Measurement Systems Outside of an Excimer Laser
Patent: 6,822,977 →
Application: 10/165,767 →
On-Line Quality Control of the Key Optical Components in Lithography Lasers Using Laser Induced Fluorescence
Patent: 6,839,375 →
Application: 10/236,036 →
Laser Gas Replenishment Method
Patent: 6,965,624 →
Application: 10/338,779 →
Publication: US 2004/0252740
Absolute Wavelength Calibration of Lithography Laser Using Multiple Element or Tandem See Through Hollow Cathode Lamp
Patent: 7,006,541 →
Application: 10/354,945 →
Publication: US 2003/0210715
Duv and Vuv Laser with on-Line Pulse Energy Monitor
Patent: 6,970,492 →
Application: 10/438,240 →
Publication: US 2003/0219057
System and Method for Delay Compensation for a Pulsed Laser
Patent: 6,993,052 →
Application: 10/441,768 →
Publication: US 2004/0004987
Excimer or Molecular Fluorine Laser System with Precision Timing
Patent: 7,308,013 →
Application: 10/699,763 →
Publication: US 2005/0031004
Reduced-Maintenance Excimer Laser with Oil-Free Solid State Pulser
Patent: 6,999,492 →
Application: 10/713,583 →
Publication: US 2005/0169341
Systems and Methods Utilizing Laser Discharge Electrodes with Ceramic Spoilers
Patent: 7,079,565 →
Application: 10/727,718 →
Publication: US 2004/0131100
Excimer or Molecular Fluorine Laser with Several Discharge Chambers
Patent: 6,987,790 →
Application: 10/776,137 →
Publication: US 2004/0202219
Master Oscillator/Power Amplifier Excimer Laser System with Pulse Energy and Pointing Control
Patent: 7,158,553 →
Application: 10/776,404 →
Publication: US 2004/0179571
Temperature Control Systems for Excimer Lasers
Patent: 7,164,703 →
Application: 10/777,434 →
Publication: US 2004/0202211
Mopa Excimer or Molecular Fluorine Laser System with Improved Synchronization
Patent: 7,366,213 →
Application: 10/847,071 →
Publication: US 2004/0240507
Master-Oscillator Power-Amplifier (Mopa) Excimer or Molecular Fluorine Laser System with Long Optics Lifetime
Patent: 7,184,204 →
Application: 10/881,103 →
Publication: US 2005/0002425
Laser Gas Replenishment Method
Patent: 7,266,137 →
Application: 11/263,626 →
Publication: US 2006/0056478
Master-Oscillator Power-Amplifier (Mopa) Excimer or Molecular Fluorine Laser System with Long Optics Lifetime
Patent: 7,245,420 →
Application: 11/654,780 →
Publication: US 2007/0115535
Related Assignments (25)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Jul 18, 1996
From: KLEINSCHMIDT, JURGEN; HEIST, PETER
To: LAMBDA PHYSIK GESELLSCHAFT ZUR HERSTELLUNG VON LASERN MBH
Reel/Frame 008128/0303 →
Assignment of Assignor's Interest Oct 30, 1997
From: BASTING, DIRK; VON BERGMANN, HURBERTUS
To: LAMBDA PHYSIK GMBH
Reel/Frame 008774/0150 →
Assignment of Assignor's Interest Jun 22, 1998
From: GOVORKOV, SERGEI V.; BASTING, DIRK
To: LAMBDA PHYSIK GMBH
Reel/Frame 009277/0007 →
Assignment of Assignor's Interest Sep 21, 1998
From: GOVORKOV, SERGEI V.; STAMM, UWE; ZSCHOCKE, WOLFGANG V.; SCHRODER, THOMAS
To: LAMBDA PHYSIK GMBH
Reel/Frame 009471/0514 →
Assignment of Assignor's Interest Nov 23, 1998
From: BASTING, DIRK; STAMM, UWE; MANN, KLAUS; OHLENBUSCH, JENS
To: LAMBDA PHYSIK GMBH
Reel/Frame 009604/0996 →
Assignment of Assignor's Interest Mar 29, 1999
From: BASTING, DIRK; GOVORKOV, SERGEI V.
To: LAMBDA PHYSIK GMBH
Reel/Frame 009870/0647 →
Assignment of Assignor's Interest Jul 26, 1999
From: BASTING, DIRK; GOVORKOV, SERGEI V.; STAMM, UWE
To: LAMBDA PHYSIK GMBH
Reel/Frame 010116/0936 →
Assignment of Assignor's Interest Aug 2, 1999
From: SCAGGS, MICHAEL; VOSS, FRANK
To: LAMBDA PHYSIK GMBH
Reel/Frame 010136/0159 →
Assignment of Assignor's Interest Sep 13, 1999
From: KLEINSCHMIDT, JURGEN; HEIST, PETER; VOSS, FRANK; GORTLER, ANDREAS
To: LAMBDA PHYSIK GMBH
Reel/Frame 010223/0953 →
Assignment of Assignor's Interest Feb 28, 2000
From: BRAGIN, IGOR; BERGER, VADIM; STAMM, UWE; REBHAN, ULRICH
To: LAMBDA PHYSIK GMBH
Reel/Frame 010646/0651 →
Assignment of Assignor's Interest Mar 6, 2000
From: BECKER DE MOS, BRUNO; STAMM, UWE; VOGLER, KLAUS
To: LAMBDA PHYSIK GMBH
Reel/Frame 010656/0154 →
Assignment of Assignor's Interest Mar 13, 2000
From: HEIST, PETER; KLEINSCHMIDT, JURGEN
To: LAMBDA PHYSIK GESELLSCHAFT ZUR HERSTELLUNG VON LASERN MBH
Reel/Frame 010677/0414 →
Assignment of Assignor's Interest May 1, 2000
From: BORNEIS, STEFAN; BRUNWINKEL, KLAUS; STAMM, UWE; VOSS, FRANK
To: LAMBDA PHYSIK GESELLSCHAFT ZUR HERSTELLUNG VON LASERN MBH
Reel/Frame 010793/0594 →
Assignment of Assignor's Interest May 30, 2000
From: STAMM, UWE; BRAGIN, IGOR; ZSCHOCKE, WOLFGANG
To: LAMBDA PHYSIK GESELLSCHAFT ZUR HERSTELLUNG VON LASERN MBH
Reel/Frame 010858/0431 →
Assignment of Assignor's Interest Jun 19, 2000
From: VOGLER, KLAUS
To: LAMBDA PHYSIK GESELLSCHAFT ZUR HERSTELLUNG VON LASERN MBH
Reel/Frame 010914/0522 →
Assignment of Assignor's Interest Jun 21, 2000
From: OSMANOW, RUSTEM; STAMM, UWE
To: LAMBDA PHYSIK AG
Reel/Frame 010922/0455 →
Assignment of Assignor's Interest Aug 11, 2000
From: KLEINSCHMIDT, JUERGEN
To: LAMBDA PHYSIK AG
Reel/Frame 011036/0986 →
Assignment of Assignor's Interest Sep 1, 2000
From: VOGLER, KLAUS WOLFGANG; HEIST, PETER
To: LAMBDA PHYSIK AG
Reel/Frame 011067/0672 →
Assignment of Assignor's Interest Oct 2, 2000
From: BERGER, VADIM; BRAGIN, IGOR
To: LAMBDA PHYSIK AG
Reel/Frame 011151/0152 →
Assignment of Assignor's Interest Oct 3, 2000
From: KLEINSCHMIDT, JUERGEN; HEIST, PETER; KRAMER, MATTHIAS
To: LAMBDA PHYSIK AG
Reel/Frame 011157/0992 →
Assignment of Assignor's Interest Nov 6, 2000
From: BRAGIN, IGOR; BERGER, VADIM; STAMM, UWE
To: LAMBDA PHYSIK AG
Reel/Frame 011217/0704 →
Assignment of Assignor's Interest Dec 7, 2000
From: KLEINSCHMIDT, JUERGEN; SCHROEDER, THOMAS
To: LAMBDA-PHYSIK AG
Reel/Frame 011353/0355 →
Assignment of Assignor's Interest Jan 26, 2001
From: KLEINSCHMIDT, JUERGEN
To: LAMBDA PHYSIK AG
Reel/Frame 011471/0162 →
Assignment of Assignor's Interest Feb 9, 2001
From: MANN, KLAUS; SCHRODER, THOMAS; SCHAFER, BERND; LEINHOS, UWE
To: LAMBDA PHYSIK AG
Reel/Frame 011503/0364 →
Change of Name May 3, 2001
From: LAMBDA PHYSIK GMBH
To: LAMBDA PHYSIK AG
Reel/Frame 011783/0175 →