Metrology tool recipe validator using best known methods
View Patent ↗A method of preparing recipes for operating a metrology tool, each recipe including a set of instructions for measuring dimensions in a microelectronic feature. A database includes a plurality of known instructions with best known methods for measuring different feature dimensions by creating a summary of a recipes used by the tool, and adding categorization attributes to identify the summary for retrieval from the database. There is provided a desired recipe having instructions for measuring desired dimensions, including a summary of parameters relating to tool function for the feature dimension to be measured. The method includes comparing the instructions in the desired recipe with the instructions in the database, identifying differences therebetween, modifying the desired recipe instructions to conform to the database instructions, verifying the desired recipe prior to using the modified desired recipe by the tool, and using the desired recipe to execute a feature measurement on the tool.
1. A method of preparing recipes for operating a metrology tool used to measure desired dimensions in microelectronic features, each recipe comprising a set of instructions for measuring at least one dimension in a microelectronic feature, comprising:
providing a database including a plurality of known instructions for measuring different dimensions in a microelectronic feature;
providing a desired recipe or portion thereof having instructions for measuring one or more desired dimensions in a microelectronic feature;
comparing the instructions in the desired recipe with the instructions in the database prior to using the recipe by the metrology tool;
identifying differences between the instructions in the desired recipe and the instructions in the database;
modifying the instructions in the desired recipe to conform to the instructions in the database;
using the modified desired recipe by the metrology tool; and
using the desired recipe to execute a microelectronic feature measurement on the metrology tool.
2. The method of claim 1 wherein the database having the plurality of known instructions for measuring different dimensions in a microelectronic feature is generated from recipes used by the metro logy tool.
3. The method of claim 1 wherein the desired recipe or portion thereof having instructions for measuring one or more desired dimensions in a microelectronic feature includes a summary of parameters relating to metrology tool function with respect to the microelectronic feature dimension to be measured.
4. The method of claim 3 wherein the parameters relating to metrology tool function with respect to the microelectronic feature dimension to be measured are selected from the group consisting of critical dimensions, overlay, film thickness, depth and other required measurements.
5. The method of claim 1 wherein the database having the plurality of known instructions for measuring different dimensions in a microelectronic feature includes access to reference images of metrology tool setup conditions.
6. The method of claim 1 further including, prior to using the modified desired recipe by the metrology tool, locking the modified desired recipe to prevent further modification.
7. The method of claim 1 further including creating the database having the plurality of known instructions for measuring different dimensions in a microelectronic feature by providing an initial recipe, creating a summary of the initial recipe, and adding to the summary categorization attributes to identify the recipe summary for retrieval from the database.
8. The method of claim 1 wherein the comparison of the instructions in the desired recipe with the instructions in the database is made during creation of the desired recipe, prior to completing the recipe.
9. The method of claim 8 further including, after modifying the instructions in the desired recipe to conform to the instructions in the database, completing the desired recipe and again comparing the instructions in the completed desired recipe with the instructions in the database, identifying differences between the instructions in the completed desired recipe and the instructions in the database; and optionally modifying the instructions in the completed desired recipe to conform to the instructions in the database prior to using the recipe at the metrology tool.
10. The method of claim 1 wherein the database having the plurality of known instructions comprises best known methods for measuring different dimensions in a microelectronic feature.
11. The method of claim 10 further including updating the database with new best known methods for measuring different dimensions in a microelectronic feature.
12. The method of claim 11 further including comparing the instructions in the desired recipe with the instructions in the updated database; identifying differences between the instructions in the desired recipe and the instructions in the updated database; modifying the instructions in the desired recipe to conform to the instructions in the updated database; using the modified desired recipe by the metrology tool; and using the desired recipe to execute a microelectronic feature measurement on the metrology tool.
13. The method of claim 1 wherein the recipe for measuring a feature is created using that feature on a wafer.
14. The method of claim 1 wherein the recipe is created without using a feature on a wafer.
15. The method of claim 1 wherein the desired recipe or portion thereof having instructions for measuring one or more desired dimensions in a microelectronic feature includes a summary of parameters relating to metrology tool function with respect to the microelectronic feature dimension to be measured, and wherein the known instructions from the database are provided based on identification of the parameters of the desired recipe prior to writing the desired recipe.
16. The method of claim 1 wherein the desired recipe or portion thereof having instructions for measuring one or more desired dimensions in a microelectronic feature includes a summary of parameters relating to metrology tool function with respect to the microelectronic feature dimension to be measured, and wherein the known instructions from the database are provided based on identification of the parameters of the desired recipe prior to verification of the desired recipe either manually or automatically.
17. A method of preparing recipes for operating a metrology tool used to measure desired dimensions in microelectronic features, each recipe comprising a set of instructions for measuring at least one dimension in a microelectronic feature, comprising:
providing a database including a plurality of known instructions with best known methods for measuring different dimensions in a microelectronic feature;
providing a desired recipe or portion thereof having instructions for measuring one or more desired dimensions in a microelectronic feature, the desired recipe or portion thereof including a summary of parameters relating to metrology tool function with respect to the microelectronic feature dimension to be measured, the parameters being selected from the group consisting of critical dimensions, overlay, film thickness, depth and other required measurements;
comparing the instructions in the desired recipe with the instructions in the database prior to using the recipe by the metrology tool;
identifying differences between the instructions in the desired recipe and the instructions in the database;
modifying the instructions in the desired recipe to conform to the instructions in the database;
using the modified desired recipe by the metrology tool; and
using the desired recipe to execute a microelectronic feature measurement on the metrology tool.
18. The method of claim 17 wherein the known instructions from the database are provided based on identification of the parameters of the desired recipe prior to writing the desired recipe.
19. The method of claim 17 wherein the known instructions from the database are provided based on identification of the parameters of the desired recipe prior to verification of the desired recipe either manually or automatically.
20. A method of preparing recipes for operating a metrology tool used to measure desired dimensions in microelectronic features, each recipe comprising a set of instructions for measuring at least one dimension in a microelectronic feature, comprising:
providing a desired recipe or portion thereof having instructions for measuring one or more desired dimensions in a microelectronic feature, the desired recipe or portion thereof including a summary of parameters relating to metrology tool function with respect to the microelectronic feature dimension to be measured, the parameters being selected from the group consisting of critical dimensions, overlay, film thickness, depth and other required measurements;
comparing the instructions in the desired recipe with the instructions in an existing recipe or portion thereof including a summary of parameters relating to metrology tool function with respect to the microelectronic feature dimension to be measured, the parameters being selected from the group consisting of critical dimensions, overlay, film thickness, depth and other required measurements for the same technology and or process prior to using the recipe by the metrology tool;
identifying differences between the instructions in the desired recipe and the instructions in the existing recipe for the same technology and or process;
modifying the instructions in the desired recipe to conform to the instructions in the existing recipe for the same technology and or process;
using the modified desired recipe by the metrology tool; and
using the desired recipe to execute a microelectronic feature measurement on the metrology tool.