IP Library Granted Patent US 7,326,465
Granted Patent B2
US 7,326,465 · App. 11/211,168 · Granted Feb 5, 2008

Integrated electronic component

Assignee: Infineon Technologies AG
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Quick Facts
Patent No.
US 7,326,465
App. No.
11/211,168
Granted
Feb 5, 2008
Kind
B2
Abstract

An integrated electronic component having a substrate, a metal multilayer system, which is arranged at least on regions of the substrate, and a nonconductive layer, which is arranged on the metal multilayer system and has at least one contact hole, in which at least one carbon nanotube is grown on the metal multilayer system at the bottom of the contact hole. The metal multilayer system includes a high-melting metal layer, a metal separating layer, a catalyst layer, and a final metal separating layer. The high-melting metal layer is composed of at least one of tantalum, molybdenum, and tungsten. The metal separating layer is composed of aluminum, gold, or silver. The catalyst layer is composed of at least one of iron, cobalt, nickel, yttrium, titanium, platinum, and palladium, and a combination thereof. The final metal separating layer, which is arranged above the catalyst layer, is composed of aluminum.

Claims (13)

1. An integrated electronic component, comprising:

a substrate;

at least one metal multilayer system, which is arranged at least on regions of the substrate and comprises:

a high-melting metal layer composed of at least one metal selected from the group consisting of tantalum, molybdenum, and tungsten;

a metal separating layer composed of aluminum, gold, or silver;

a catalyst layer composed of at least one metal selected from the group consisting of iron, cobalt, nickel, yttrium, titanium, platinum, and palladium, and a combination thereof; and

a final metal separating layer, which is arranged above the catalyst layer and is composed of aluminum; and

a nonconductive layer, which is arranged on the metal multilayer system and has at least one contact hole, in which at least one carbon nanotube is grown on the metal multilayer system at the bottom of the contact hole.

2. The component as claimed in claim 1 , wherein the nonconductive layer is composed of a material selected from the group consisting of SiO 2 , Si x N y , Al 2 O 3 , ZrO 2 , and HfO 2 , and a combination thereof.

3. The component as claimed in claim 1 , wherein the carbon nanotube is a single-walled carbon nanotube (SWCNT) or a multi-walled carbon nanotube (MWCNT).

4. The component as claimed in claim 1 , wherein the metal multilayer system is arranged on a first conductive layer as the substrate.

5. The component as claimed in claim 4 , further comprising a second conductive layer, wherein the first conductive layer is electrically conductively connected to the second conductive layer via the at least one nanotube in the contact hole.

6. The component as claimed in claim 5 , wherein the first and second conductive layers comprise at least one material selected from the group consisting of copper, aluminum, and a combination of Ta, TaN, Ti, and TiN.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 15, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 036873/0758 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 12, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023768/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 19, 2005
From: SEIDEL, ROBERT; KREUPL, FRANZ; GRAHAM, ANDREW
To: INFINEON TECHNOLOGIES AG
Reel/Frame 016912/0667 →
Priority Claims (1)
DE 103 07 815 · Feb 24, 2003 · national
Continuity (2)
Continuation PCTEP200400115800 · Feb 9, 2004
Related Publication 20060234080A1 · Oct 19, 2006