Hybrid FET incorporating a finFET and a planar FET
View Patent ↗A stack of a vertical fin and a planar semiconductor portion are formed on a buried insulator layer of a semiconductor-on-insulator substrate. A hybrid field effect transistor (FET) is formed which incorporates a finFET located on the vertical fin and a planar FET located on the planar semiconductor portion. The planar FET enables a continuous spectrum of on-current. The surfaces of the vertical fin and the planar semiconductor portion may be set to coincide with crystallographic orientations. Further, different crystallographic orientations may be selected for the surfaces of the vertical fin and the surfaces of the planar semiconductor portion to tailor the characteristics of the hybrid FET.
1. A semiconductor structure comprising:
a planar semiconductor portion having a first width and a first height and located above and abutting an insulator layer;
a planar source region located in one side of said planar semiconductor portion;
a planar drain region separated from and located on an opposite side of said planar source region in said planar semiconductor portion;
a semiconductor fin having a second width and located above and abutting an upper surface of said planar semiconductor portion, wherein said planar semiconductor portion and a portion of said semiconductor fin comprise different semiconductor materials, and wherein said first width is greater than said second width;
a gate dielectric abutting sidewalls of said vertical fin and horizontal upper surface of said planar semiconductor portion; and
a gate electrode abutting said gate dielectric and overlying said planar semiconductor portion and said vertical fin.
2. The semiconductor structure of claim 1 , wherein said planar semiconductor portion comprises a first semiconductor material and an entirety of said semiconductor fin comprises a second semiconductor material, wherein said first semiconductor material and said second semiconductor material are different.
3. The semiconductor structure of claim 1 , wherein said planar semiconductor portion comprises a first semiconductor material and said semiconductor fin comprises a bottom semiconductor fin portion comprising a second semiconductor material and a top semiconductor fin portion comprising a third semiconductor material, wherein said first semiconductor material and said second semiconductor material are different.
4. The semiconductor structure of claim 1 , further comprising:
a fin source region located in one side of said semiconductor fin and abutting said planar source region and located in said semiconductor fin; and
a fin drain region separated from and located on an opposite side of said fin source region and abutting said planar drain region and located in said semiconductor fin.
5. The semiconductor structure of claim 1 , wherein said upper surface of said planar semiconductor portion has a first crystallographic orientation and a bottom surface of said semiconductor fin abutting said planar semiconductor portion has a second crystallographic orientation, wherein said first crystallographic orientation and said second crystallographic orientation are different.
6. A semiconductor structure comprising:
a planar semiconductor portion having a first width and located above and abutting an insulator layer;
a dielectric material portion having a second width and located above and abutting said planar semiconductor portion, wherein said first width is greater than said second width;
a semiconductor fin having said second width and located above and abutting said dielectric material portion;
a gate dielectric abutting sidewalls of said vertical fin and horizontal upper surface of said planar semiconductor portion; and
a gate electrode abutting said gate dielectric and overlying said planar semiconductor portion and said vertical fin;
a planar source region located in one side of said planar semiconductor portion; and
a planar drain region separated from and located on an opposite side of said planar source region in said planar semiconductor portion.
7. The semiconductor structure of claim 6 , wherein said planar semiconductor portion comprises a first semiconductor material and said semiconductor fin comprises a second semiconductor material, wherein said first semiconductor material and said second semiconductor material are different.
8. The semiconductor structure of claim 6 , further comprising:
a planar body region laterally abutting said planar source region and said planar drain region and located in said planar semiconductor portion;
a fin source region located in one side of said semiconductor fin;
a fin drain region separated from and located on an opposite side of said fin source region in said semiconductor fin; and
a fin body region laterally abutting said fin source region and said fin drain region and located in said semiconductor fin, wherein edges of said planar body region and said fin source region are self-aligned to edges of said gate electrode with a constant offset, wherein said planar body region and said fin body region have a doping of a first conductivity type, wherein said planar source region, said planar drain region, said fin source region, and said fin drain region have a doping of a second conductivity type, and wherein said second conductivity type is the opposite of said first conductivity type.
9. The semiconductor structure of claim 6 , further comprising:
a pair of epitaxial raised source portions abutting said planar source region, wherein each of said pair of epitaxial raised source portions is epitaxially aligned to said planar source region, has a doping of said second conductivity type, has a vertical cross-sectional area of an inverted L-shape, and separated from each other and said semiconductor fin; and
a pair of epitaxial raised drain portions abutting said planar drain region, wherein each of said pair of epitaxial raised drain portions is epitaxially aligned to said planar drain region, has a doping of said second conductivity type, has a vertical cross-sectional area of an inverted L-shape, and separated from each other and said semiconductor fin.
10. The semiconductor structure of claim 6 , wherein said upper surface of said planar semiconductor portion has a first crystallographic orientation and a bottom surface of said semiconductor fin abutting said planar semiconductor portion has a second crystallographic orientation, wherein said first crystallographic orientation and said second crystallographic orientation are different.
11. A method of forming a semiconductor structure comprising:
forming an upper semiconductor layer directly on a semiconductor-on-insulator (SOI) layer of a semiconductor-on-insulator (SOI) substrate, wherein said upper semiconductor layer and said SOI layer comprise different semiconductor materials;
patterning said SOI layer, wherein a remaining portion of said SOI layer constitutes a planar semiconductor portion having a first width;
patterning said upper semiconductor layer, wherein a remaining portion of said upper semiconductor layer constitutes a semiconductor fin having a second width, wherein said first width is greater than said second width;
forming a gate dielectric on sidewalls of said semiconductor fin and on horizontal surfaces of said planar semiconductor portion;
forming a gate electrode abutting said gate dielectric and overlying said planar semiconductor portion and said vertical fin;
forming a planar source region in one side of said planar semiconductor portion; and
forming a planar drain region on an opposite side of said planar source region in said planar semiconductor portion.
12. The method of claim 11 , further comprising:
etching said upper semiconductor layer selective to said SOI layer;
forming a gate conductor layer over said gate dielectric;
forming a gate cap dielectric layer on said gate conductor layer; and
patterning said gate conductor and said gate cap dielectric layer, thereby forming a stack of said gate electrode and a gate cap over a middle portion of said semiconductor fin and over a middle portion of said planar semiconductor portion, wherein sidewalls of said gate electrode and said gate cap are vertically coincident.
13. The method of claim 11 , further comprising:
forming a fin source region in one side of said semiconductor fin and located in said semiconductor fin;
forming a fin drain region on an opposite side of said fin source region in said semiconductor fin, wherein edges of said planar source region, said planar drain region, said fin source region, and said fin drain region are self-aligned to edges of said gate conductor with a constant offset.
14. The method of claim 13 , further comprising:
forming a pair of epitaxial raised source portions directly on said planar source region, wherein each of said pair of epitaxial raised source portions is epitaxially aligned to said planar source region, has a doping of said second conductivity type, has a vertical cross-sectional area of an inverted L-shape, and separated from each other and said semiconductor fin; and
forming a pair of epitaxial raised drain portions directly on said planar drain region, wherein each of said pair of epitaxial raised drain portions is epitaxially aligned to said planar drain region, has a doping of said second conductivity type, has a vertical cross-sectional area of an inverted L-shape, and separated from each other and said semiconductor fin.
15. The method of claim 14 , further comprising:
forming a metal semiconductor alloy fin source portion directly on said fin source region;
forming a pair of metal semiconductor alloy raised source portions directly on said pair of epitaxial raised source portions, wherein said metal semiconductor alloy fin source portion abuts each of said pair of metal semiconductor alloy raised source portions with a seam adjoining said planar source region;
forming a metal semiconductor alloy fin drain portion directly on said fin drain region; and
forming a pair of metal semiconductor alloy raised drain portions directly on said pair of epitaxial raised drain portions, wherein said metal semiconductor alloy fin drain portion abuts each of said pair of metal semiconductor alloy raised drain portions with a seam adjoining said planar drain region.
16. A method of forming a semiconductor structure comprising:
forming a stack of an etch stop layer and an upper semiconductor layer directly on a semiconductor-on-insulator (SOI) layer of a semiconductor-on-insulator (SOI) substrate, wherein said etch stop layer and said upper semiconductor layer comprise different materials;
patterning said SOI layer, wherein a remaining portion of said SOI layer constitutes a planar semiconductor portion having a first width;
patterning said upper semiconductor layer selective to said SOI layer, wherein a remaining portion of said upper semiconductor layer constitutes a semiconductor fin having a second width, wherein said first width is greater than said second width;
forming a gate dielectric on sidewalls of said semiconductor fin and on horizontal surfaces of said planar semiconductor portion;
forming a gate electrode abutting said gate dielectric and overlying said planar semiconductor portion and said vertical fin;
forming a planar source region in one side of said planar semiconductor portion; and
forming a planar drain region on an opposite side of said planar source region in said planar semiconductor portion.
17. The method of claim 16 , wherein said etch stop layer comprises a dielectric material or a semiconductor material in epitaxial alignment with said SOI layer and said upper semiconductor layer.
18. The method of claim 16 , further comprising:
forming a fin source region in one side of said semiconductor fin and located in said semiconductor fin;
forming a fin drain region on an opposite side of said fin source region in said semiconductor fin, wherein edges of said planar source region, said planar drain region, said fin source region, and said fin drain region are self-aligned to edges of said gate conductor with a constant offset.
19. The method of claim 18 , further comprising:
forming a pair of epitaxial raised source portions directly on said planar source region, wherein each of said pair of epitaxial raised source portions is epitaxially aligned to said planar source region, has a doping of said second conductivity type, has a vertical cross-sectional area of an inverted L-shape, and separated from each other and said semiconductor fin; and
forming a pair of epitaxial raised drain portions directly on said planar drain region, wherein each of said pair of epitaxial raised drain portions is epitaxially aligned to said planar drain region, has a doping of said second conductivity type, has a vertical cross-sectional area of an inverted L-shape, and separated from each other and said semiconductor fin.
20. The method of claim 19 , further comprising:
forming a metal semiconductor alloy fin source portion directly on said fin source region;
forming a pair of metal semiconductor alloy raised source portions directly on said pair of epitaxial raised source portions, wherein said metal semiconductor alloy fin source portion abuts each of said pair of metal semiconductor alloy raised source portions with a seam adjoining said planar source region;
forming a metal semiconductor alloy fin drain portion directly on said fin drain region; and
forming a pair of metal semiconductor alloy raised drain portions directly on said pair of epitaxial raised drain portions, wherein said metal semiconductor alloy fin drain portion abuts each of said pair of metal semiconductor alloy raised drain portions with a seam adjoining said planar drain region.