Epitaxial growth method of a zinc oxide based semiconductor layer, epitaxial crystal structure, epitaxial crystal growth apparatus, and semiconductor device
It is provided a hetero epitaxial growth method, a hetero epitaxial crystal structure, a hetero epitaxial growth apparatus and a semiconductor device, the method includes forming a buffer layer formed with the orienting film of an oxide, or the orienting film of nitride on a heterogeneous substrate; and performing crystal growth of a zinc oxide based semiconductor layer on the buffer layer using a halogenated group II metal and an oxygen material. It is provided a homo epitaxial growth method, a homo epitaxial crystal structure, a homo epitaxial growth apparatus and a semiconductor device, the homo epitaxial growth method includes introducing reactant gas mixing zinc containing gas and oxygen containing gas on a zinc oxide substrate; and performing crystal growth of a zinc oxide based semiconductor layer on the zinc oxide substrate.
1. A hetero epitaxial growth method comprising:
forming a buffer layer in contact with a heterogeneous substrate, the heretogeneous substrate composed of a substrate selected from the group consisting of an a-plane sapphire substrate, a silicon substrate, a SiC substrate, a GaAs substrate, a GaP substrate, and a GaN-based substrate; and
performing crystal growth of a zinc oxide based semiconductor layer on the buffer layer using a halogenated group II metal and an oxygen material, wherein
the step of forming the buffer layer includes the step of performing crystal growth of another zinc oxide based semiconductor layer on the heterogeneous substrate using a group II metal and an oxygen material, and zinc which is an elemental metal without any bonding to another element is used as the group II metal, wherein
a reactant gas is zinc and water in the step of forming the buffer layer, and a reactant gas is zinc chloride and water in the step of performing the crystal growth of the zinc oxide based semiconductor layer, and wherein
in the step of performing the crystal growth of the zinc oxide based semiconductor layer, a crystal growth temperature is not less than 800 degrees C., and a supplying ratio VI/II of a group VI element and a group II element is more than 1 and not more than 100.
2. The hetero epitaxial growth method according to claim 1 , wherein
in the step of performing the crystal growth of the zinc oxide based semiconductor layer, the crystal growth temperature is approximately 1000 degrees C.
3. The hetero epitaxial growth method according to claim 1 , wherein
in the step of performing the crystal growth of the zinc oxide based semiconductor layer, the supplying ratio VI/II of a group VI element and a group II element is approximately 20.