Semiconductor device and method of forming substrate including embedded component with symmetrical structure
A semiconductor device comprises a first conductive layer. A second conductive layer is formed over the first conductive layer. A semiconductor component is disposed over the first conductive layer. The second conductive layer lies in a plane between a top surface of the semiconductor component and a bottom surface of the semiconductor component. A third conductive layer is formed over the semiconductor component opposite the first conductive layer. The semiconductor device includes a symmetrical structure. A first insulating layer is formed between the first conductive layer and semiconductor component. A second insulating layer is formed between the semiconductor component and third conductive layer. A height of the first insulating layer between the first conductive layer and semiconductor component is between 90% and 110% of a height of the second insulating layer between the semiconductor component and third conductive layer. The semiconductor component includes a passive device.
1. A method of making a semiconductor device, comprising:
providing a substrate including a first conductive layer;
forming a first insulating layer over the first conductive layer;
forming a fourth conductive layer over the first insulating layer;
forming a third insulating layer over the first insulating layer and fourth conductive layer;
forming a second conductive layer over the first conductive layer and third insulating layer;
forming an opening through the third insulating layer over the fourth conductive layer;
removing the fourth conductive layer;
disposing a semiconductor component in the opening of the third insulating layer such that the second conductive layer lies in a plane between a top surface of the semiconductor component and a bottom surface of the semiconductor component;
forming a second insulating layer over the semiconductor component; and
forming a third conductive layer over the second insulating layer.
2. The method of claim 1 , wherein the semiconductor component includes a capacitor.
3. The method of claim 1 , further including forming a conductive via through the first insulating layer and third insulating layer by forming a first opening through the first conductive layer, first insulating layer, and third insulating layer to expose the second conductive layer.
4. The method of claim 3 , further including forming a second opening through the second insulating layer to expose the second conductive layer directly opposite the first opening.
5. The method of claim 1 , further including forming a first opening through the first insulating layer to expose a terminal of the semiconductor component.
6. The method of claim 5 , further including forming a second opening through the second insulating layer to expose the terminal of the semiconductor component directly opposite the first opening.
7. A method of making a semiconductor device, comprising:
providing a substrate;
forming a first conductive layer over the substrate;
forming a first insulating layer including an opening through the first insulating layer over the first conductive layer;
forming a second conductive layer over the first insulating layer;
removing the first conductive layer within the opening; and
disposing a semiconductor component over the substrate in the opening of the first insulating layer such that the second conductive layer is approximately centered between a top surface of the semiconductor component and a bottom surface of the semiconductor component.
8. The method of claim 7 , further including forming a second insulating layer over the semiconductor component.
9. The method of claim 8 , wherein the semiconductor device includes a vertically symmetrical structure.
10. The method of claim 8 further including forming a third conductive layer over the second insulating layer opposite the semiconductor component.
11. The method of claim 7 , wherein the second conductive layer lies in a plane that bisects the semiconductor component.
12. The method of claim 7 , wherein the semiconductor component includes a passive device.
13. A method of making a semiconductor device, comprising:
providing a first conductive layer;
forming a first insulating layer over the first conductive layer;
forming a second conductive layer over the first insulating layer;
disposing a semiconductor component over the first conductive layer with the second conductive layer within a height of the semiconductor component;
forming a second insulating layer over the semiconductor component, wherein a height of the first insulating layer between the first conductive layer and semiconductor component is between 90% and 110% of a height of the second insulating layer between the semiconductor component and third conductive layer; and
forming a third conductive layer over the second insulating layer.
14. The method of claim 13 , further including forming the semiconductor device to include a symmetrical structure.
15. The method of claim 13 , wherein disposing a semiconductor component over the first conductive layer includes disposing the semiconductor component with the second conductive layer lying in a plane that bisects the semiconductor component.
16. The method of claim 13 , further including providing the semiconductor component to include a capacitor.
17. The method of claim 13 , further including providing the semiconductor component to include a passive device.
18. The method of claim 13 , further including forming an opening through the first insulating layer or second insulating layer to expose a terminal of the semiconductor component.
19. The method of claim 13 , further including forming an opening through the first insulating layer or second insulating layer to expose the second conductive layer.
20. A method of making a semiconductor device, comprising:
providing a first insulating layer;
forming a first conductive layer over the first insulating layer;
disposing a semiconductor component over the first insulating layer with the first conductive layer approximately centered within a height of the semiconductor component; and
forming a second insulating layer over the semiconductor component, wherein a height of the first insulating layer under a first surface of the semiconductor component is between 90% and 110% of a height of the second insulating layer over a second surface of the semiconductor component opposite the first surface.
21. The method of claim 20 , further including forming the semiconductor device to include a vertically symmetrical structure.
22. The method of claim 20 , further including:
providing a second conductive layer;
disposing the first insulating layer over the second conductive layer; and
forming a third conductive layer over the second insulating layer.
23. The method of claim 20 , wherein disposing the semiconductor component over the first insulating layer includes disposing the semiconductor component over the first insulating layer with the first conductive layer in a plane that bisects the semiconductor component.
24. The method of claim 20 , further including providing the semiconductor component to include a passive device.