IP Library Granted Patent US 6,949,269
Granted Patent Utility
US 6,949,269 · Confirmation No. 4855

METHOD FOR PRODUCING VERTICAL PATTERNED LAYERS MADE OF SILICON DIOXIDE

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2005-03-14 FWCLM Index of Claims 1 View
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2005-03-14 CLM Claims 7 View
2004-12-14 A... Amendment/Request for Reconsideration-After Non-Final Rejection 1 View
2004-12-14 CLM Claims 7 View
2004-12-14 REM Applicant Arguments/Remarks Made in an Amendment 9 View
2004-12-14 WFEE Fee Worksheet (SB06) 1 View
2004-12-14 WFEE Fee Worksheet (SB06) 1 View
2004-09-14 CTNF Non-Final Rejection 6 View
2004-09-14 1449 List of References cited by applicant and considered by examiner 1 View
2004-09-14 892 List of references cited by examiner 1 View
2004-09-14 BIB Bibliographic Data Sheet 1 View
2004-09-14 SRFW Search information including classification, databases and other search related notes 1 View
2004-09-02 SRNT Examiner's search strategy and results 1 View
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2004-04-12 FRPR Certified Copy of Foreign Priority Application 40 View
2004-01-26 PEFN Pre-Exam Formalities Notice 2 View
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2003-11-12 FOR Foreign Reference 10 View
2003-11-12 FOR Foreign Reference 54 View
2003-10-21 TRNA Transmittal of New Application 2 View
2003-10-21 SPEC Specification 27 View
2003-10-21 CLM Claims 4 View
2003-10-21 ABST Abstract 1 View
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2003-10-21 OATH Oath or Declaration filed 2 View
2003-10-21 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
Patent No.
US 6,949,269
App. No.
10/690,002
Filed
2003-10-21
Granted
2005-09-27
Pub. No.
US20040146655A1
Art Unit
1762
PTA
-2 days