IP Library Granted Patent US 7,321,157
Granted Patent B2
US 7,321,157 · App. 11/096,870 · Granted Jan 22, 2008

CoSb

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Quick Facts
Patent No.
US 7,321,157
App. No.
11/096,870
Granted
Jan 22, 2008
Kind
B2
Abstract

A method of fabricating a CoSb 3 -based thermoelectric device is disclosed. The method includes providing a high-temperature electrode, providing a buffer layer on the high-temperature electrode, forming composite n-type and p-type layers, attaching the buffer layer to the composite n-type and p-type layers, providing a low-temperature electrode on the composite n-type and p-type layers and separating the composite n-type and p-type layers from each other to define n-type and p-type legs between the high-temperature electrode and the low-temperature electrode.

Claims (41)

1. A product comprising:

a thermoelectric device comprising:

a high-temperature electrode;

a buffer layer attached directly to said high-temperature electrode the buffer layer having a roughened surface, wherein the buffer layer comprises sintered powder or foil;

n-type and p-type legs provided in electrical contact with said buffer layer; wherein each of the n-type and p-type legs are directly attached to the roughened surface of the buffer layer and

a low-temperature electrode provided in electrical contact with said n-type and p-type legs.

2. The product of claim 1 wherein said composite n-type and p-type layers comprises CoSb 3 .

3. The product of claim 2 wherein said buffer layer comprises titanium.

4. The product of claim 3 wherein said high-temperature electrode comprises molybdenum.

5. A product as set forth in claim 1 wherein the high-temperature electrode includes a roughened surface and wherein the buffer layer is attached directly to the high-temperature electrode at the roughened surface.

6. A product as set forth in claim 1 wherein the high-temperature electrode includes a roughened surface and wherein the buffer layer is attached to the roughened surface of the high-temperature electrode.

7. A product comprising a thermoelectric device, comprising:

a high-temperature electrode having a first roughened surface;

providing a buffer layer attached directly to said high-temperature electrode wherein the buffer layer comprises sintered powder or a foil;

the buffer layer having a second roughened surfaces n-type and p-type layers and wherein at least one of the n-type or p-type layers is directly attached to said buffer layer wherein at least one of the n-type or p-type layers comprises CoSb 3 ;

a low-temperature electrode on at least one of the n-type or p-type layers.

8. The product of claim 7 wherein said buffer layer comprises titanium.

9. The product of claim 7 wherein said high-temperature electrode comprises molybdenum.

10. The product of claim 7 wherein each of the n-type and p-type layers comprises sintered material sintered by spark plasma sintering.

11. The product of claim 7 wherein said buffer layer comprises titanium.

12. The product of claim 11 wherein said high-temperature electrode comprises molybdenum.

13. A product comprising:

a thermoelectric device comprising:

a high-temperature electrode;

a buffer layer attached directly to said high-temperature electrode;

n-type and p-type legs provided in electrical contact with said buffer layer;

a low-temperature electrode provided in electrical contact with said n-type and p-type legs; and

a DC pulse generator electrically connected to the high-temperature electrode and low-temperature electrode.

14. A product as set forth in claim 1 wherein the buffer layer comprises sintered powder.

15. A product as set forth in claim 2 wherein the buffer layer comprises a foil.

16. A product as set forth in claim 2 wherein the buffer layer is substantially planar.

17. A product as set forth in claim 7 wherein the buffer layer comprises sintered powder.

18. A product a set forth in claim 7 wherein the buffer layer comprises a foil.

19. A product as set forth in claim 7 wherein the buffer layer is substantially planar.

20. A product comprising:

a thermoelectric device comprising:

a high-temperature electrode;

a buffer layer attached directly to said high-temperature electrode, and wherein the buffer layer includes a roughened surface;

n-type and p-type legs provided in electrical contact with said buffer layer; wherein each of the n-type and p-type legs are directly attached to the roughened surface of the buffer layer;

a low-temperature electrode provided in electrical contact with said n-type and p-type legs; and

a DC pulse generator electrically connected to the high-temperature electrode and low-temperature electrode.

Assignments (12)
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2014
From: WILMINGTON TRUST COMPANY
To: GM GLOBAL TECHNOLOGY OPERATIONS LLC
Reel/Frame 034189/0065 →
CHANGE OF NAME Recorded Feb 10, 2011
From: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
To: GM GLOBAL TECHNOLOGY OPERATIONS LLC
Reel/Frame 025780/0936 →
SECURITY AGREEMENT Recorded Nov 8, 2010
From: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
To: WILMINGTON TRUST COMPANY
Reel/Frame 025327/0001 →
RELEASE OF SECURITY INTEREST Recorded Nov 4, 2010
From: UNITED STATES DEPARTMENT OF THE TREASURY
To: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
Reel/Frame 025245/0442 →
RELEASE OF SECURITY INTEREST Recorded Nov 4, 2010
From: UAW RETIREE MEDICAL BENEFITS TRUST
To: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
Reel/Frame 025311/0770 →
SECURITY AGREEMENT Recorded Aug 28, 2009
From: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
To: UAW RETIREE MEDICAL BENEFITS TRUST
Reel/Frame 023162/0001 →
SECURITY AGREEMENT Recorded Aug 27, 2009
From: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
To: UNITED STATES DEPARTMENT OF THE TREASURY
Reel/Frame 023156/0052 →
RELEASE OF SECURITY INTEREST Recorded Aug 21, 2009
From: CITICORP USA, INC. AS AGENT FOR BANK PRIORITY SECURED PARTIES; CITICORP USA, INC. AS AGENT FOR HEDGE PRIORITY SECURED PARTIES
To: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
Reel/Frame 023127/0468 →
RELEASE OF SECURITY INTEREST Recorded Aug 20, 2009
From: UNITED STATES DEPARTMENT OF THE TREASURY
To: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
Reel/Frame 023124/0429 →
SECURITY AGREEMENT Recorded Apr 16, 2009
From: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
To: CITICORP USA, INC. AS AGENT FOR BANK PRIORITY SECURED PARTIES; CITICORP USA, INC. AS AGENT FOR HEDGE PRIORITY SECURED PARTIES
Reel/Frame 022553/0446 →
SECURITY AGREEMENT Recorded Feb 4, 2009
From: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
To: UNITED STATES DEPARTMENT OF THE TREASURY
Reel/Frame 022201/0405 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 14, 2005
From: CHEN, LIDONG; FAN, JUNFENG; BAI, SHENGQIANG; YANG, JIHUI
To: SHANGAI INSTITUTE OF CERAMICS CHINESE ACADEMY OF SCIENCES; GM GLOBAL TECHNOLOGY OPERATIONS, INC.
Reel/Frame 016525/0694 →