Semiconductor device and method of forming double-sided through vias in saw streets
A semiconductor device is made by creating a gap between semiconductor die on a wafer. An insulating material is deposited in the gap. A first portion of the insulating material is removed from a first side of the semiconductor wafer to form a first notch. The first notch is less than a thickness of the semiconductor die. A conductive material is deposited into the first notch to form a first portion of the conductive via within the gap. A second portion of the insulating material is removed from a second side of the semiconductor wafer to form a second notch. The second notch extends through the insulating material to the first notch. A conductive material is deposited into the second notch to form a second portion of the conductive via within the gap. The semiconductor wafer is singulated through the gap to separate the semiconductor die.
1. A semiconductor device, comprising:
a semiconductor die having a contact pad formed over the semiconductor die;
an insulating material formed in a peripheral region around the semiconductor die, wherein the insulating material includes a first notch formed from a first surface of the insulating material through a first portion of the insulating material that is less than a thickness of the insulating material and a second notch formed from a second surface of the insulating material opposite the first surface through a second portion of the insulating material;
a conductive via formed through the insulating material around the semiconductor die, the conductive via including,
(a) a first conductive material deposited into the first notch to form a first portion of the conductive via in the insulating material, and
(b) a second conductive material deposited into the second notch to form a second portion of the conductive via in the insulating material; and
a conductive layer formed over the semiconductor die and insulating layer between the contact pad and conductive via.
2. The semiconductor device of claim 1 , wherein the conductive via is tapered or vertical.
3. The semiconductor device of claim 1 , further including a conductive lining formed in the first and second notches, wherein the first and second conductive material conforms to the conductive lining in the first and second notches.
4. The semiconductor device of claim 1 , wherein the conductive via is singulated to form a conductive half via.
5. The semiconductor device of claim 1 , further including a plurality of stacked semiconductor die electrically interconnected through the conductive vias.
6. The semiconductor device of claim 1 , wherein the insulating material is deposited under the semiconductor die.
7. The semiconductor device of claim 1 , further including a through silicon via formed under the contact pad.
8. A semiconductor device, comprising:
a semiconductor die;
an insulating material deposited in a peripheral region around the semiconductor die; and
a double-sided conductive via formed in the insulating material in the peripheral region, the double-sided conductive via having first and second portions formed through opposite surfaces of the insulating material.
9. The semiconductor device of claim 8 , wherein the double-sided conductive via is tapered or vertical.
10. The semiconductor device of claim 8 , further including a plurality of rows of double-sided conductive vias formed in the peripheral region.
11. The semiconductor device of claim 8 , wherein the double-sided conductive via is electrically connected to a contact pad on the semiconductor die.
12. The semiconductor device of claim 8 , further including a plurality of stacked semiconductor devices electrically interconnected by the double-sided conductive via.