Push-pull programmable logic device cell
View Patent ↗A memory cell includes a non-volatile p-channel transistor having a source coupled to a first potential, a drain, and a gate. A non-volatile n-channel transistor has a source coupled to a second potential, a drain, and a gate. A switch transistor has a gate coupled to a switch node, a source, and a drain. A stress transistor has a source and drain coupled between the drain of the non-volatile p-channel transistor and the drain of the non-volatile n-channel transistor, the stress transistor having a gate coupled to a gate bias circuit. Where one of the first or second potentials is a bit line, an isolation transistor is coupled between the other of the second potentials and one of the non-volatile transistors.
1. A memory cell including:
a non-volatile p-channel transistor having a source coupled to a first potential, a drain, and a gate;
a non-volatile n-channel transistor having a source coupled to a second potential, a drain, and a gate; and
a stress transistor having a source and drain directly connected between the drain of the non-volatile p-channel transistor and the drain of the non-volatile n-channel transistor, the stress transistor having a gate coupled to a gate bias circuit.
2. The memory cell of claim 1 , further including a switch transistor having a gate coupled to a switch node, a source, and a drain.
3. The memory cell of claim 1 wherein:
the stress transistor is an n-channel transistor having a source directly connected to the drain of the non-volatile n-channel transistor and a drain directly connected to the drain of the non-volatile p-channel transistor; and
the memory cell further including an n-channel switch transistor having a gate coupled to the drain of the stress transistor and the drain of the non-volatile n-channel transistor, a source, and a drain; and
the switch node is coupled to the drain of the non-volatile p-channel transistor.
4. The memory cell of claim 1 wherein:
the stress transistor is a p-channel transistor having a source directly connected to the
drain of the non-volatile p-channel transistor and a drain directly connected to the drain of the non-volatile n-channel; and
the memory cell further including an n-channel switch transistor having a gate directly connected to the drain of the stress transistor and the drain of the non-volatile n-channel transistor, a source, and a drain; and
the switch node is coupled to the drain of the non-volatile n-channel transistor.
5. The memory cell of claim 2 wherein the switch transistor is an n-channel transistor.
6. A memory cell including:
a non-volatile p-channel transistor having a drain coupled to a switch node, a source, and a gate;
a non-volatile n-channel transistor having a source coupled to a bit line, a drain coupled to the switch node, and a gate; and
an isolation transistor having a source and drain coupled between a first potential and the drain of the non-volatile p-channel transistor, the isolation transistor having a gate.
7. The memory cell of claim 6 , further including a switch transistor having a gate coupled to the switch node and to the drain of the non-volatile p-channel transistor, a source, and a drain.
8. The memory cell of claim 6 wherein the isolation transistor is a p-channel transistor having a source coupled to the first potential, a drain coupled to the source of the non-volatile p-channel transistor, and a gate.
9. The memory cell of claim 7 wherein the switch transistor is an n-channel transistor.
10. A memory cell including:
a non-volatile p-channel transistor having a source coupled to a bit line, a drain coupled to a switch node, and a gate;
a non-volatile n-channel transistor having a source, a drain coupled to the switch node, and a gate; and
an isolation transistor having a source and drain coupled between a first potential and the source of the non-volatile n-channel transistor, the isolation transistor having a gate.
11. The memory cell of claim 10 , further including a switch transistor having a source, a drain, and a gate coupled to the switch node and to the drain of the non-volatile p-channel transistor.
12. The memory cell of claim 10 wherein the isolation transistor is an n-channel transistor having a source coupled to the first potential, a drain coupled to the source of the non-volatile n-channel transistor, and a gate.
13. The memory cell of claim 11 wherein the switch transistor is an n-channel transistor.
14. A memory cell including:
a non-volatile p-channel transistor having a source, a drain, and a gate;
a non-volatile n-channel transistor having a source coupled to a bit line, a drain coupled to a switch node, and a gate;
a p-channel isolation transistor having a source coupled to a first potential, a drain coupled to the source of the non-volatile p-channel transistor, and a gate; and
a p-channel stress transistor having a source coupled to the drain of the non-volatile p-channel transistor, a drain coupled to the switch node, and a gate.
15. The memory cell of claim 14 , further including a switch transistor having a source, a drain, and a gate coupled to the switch node.
16. A memory cell including:
a non-volatile p-channel transistor having a source coupled to a bit line, a drain, and a gate;
a non-volatile n-channel transistor having a source, a drain coupled to a switch node, and a gate;
an n-channel isolation transistor having a source coupled to a first potential, a drain coupled to the source of the non-volatile n-channel transistor, and a gate; and
a p-channel stress transistor having a source coupled to the drain of the non-volatile p-channel transistor, a drain coupled to the switch node, and a gate.
17. The memory cell of claim 16 , further including a switch transistor having a source, a drain, and a gate coupled to the switch node.