IP Library › Granted Patent US 12,512,366
Granted Patent Utility
US 12,512,366 · Confirmation No. 1118

METHOD OF MAKING HIGH ASPECT RATIO OPENINGS IN A SEMICONDUCTOR DEVICE USING ION IMPLANTATED REGROWN CLADDING MASK

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Quick Facts
Patent No.
US 12,512,366
App. No.
18/613,834
Filed
2024-03-22
Granted
2025-12-30
Pub. No.
US20240379424A1
Examiner
HO, TU TU V
Art Unit
2818
PTA
-23 days