Patent Assignment
Reel/Frame 009151/0147
Assignment of Assignor's Interest
Recorded: 1998-05-06
Pages: 4
Assignors
OHASHI, TADASHI
Executed: 1998-03-20
CHAKI, KATUHIRO
Executed: 1998-03-20
XIN, PING
Executed: 1998-03-20
FUJII, TATSUO
Executed: 1998-03-20
IWATA, KATSUYUKI
Executed: 1998-03-20
MITANI, SHINICHI
Executed: 1998-03-20
HONDA, TAKAAKI
Executed: 1998-03-20
Assignees
TOSHIBA CERAMICS CO., LTD.
26-2, NISHI-SHINJUKU 1-CHOME, SHINJUKU-KU, TOKYO, 163, JAPAN
TOSHIBA KIKAI KABUSHIKIKAISHA
2-11, GINZA 4-CHOME, CHUUOU-KU, TOKYO, 104, JAPAN
Covered Property
(1)
Vapor Deposition Apparatus and Method for Forming Thin Film
Patent:
6,059,885 →
Application:
08/991,407 →
Related Assignments
(5)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Aug 15, 2006
From: TOSHIBA KIKAI KABUSHIKIKAISHA
To: NUFLARE TECHNOLOGY, INC.
Reel/Frame 018120/0348 →
Change of Address
Sep 22, 2006
From: TOSHIBA CERAMICS CO., LTD.
To: TOSHIBA CERAMICS CO., LTD.
Reel/Frame 018291/0382 →
Merger
Sep 13, 2007
From: TOSHIBA CERAMICS CO., LTD.
To: COVALENT MATERIALS CORPORATION
Reel/Frame 019817/0749 →
Assignment of Assignor's Interest
Mar 11, 2013
From: COVALENT MATERIALS CORPORATION
To: COVALENT SILICON CORPORATION
Reel/Frame 029962/0497 →
Change of Name
Mar 13, 2013
From: COVALENT SILICON CORPORATION
To: GLOBALWAFERS JAPAN CO., LTD.
Reel/Frame 029991/0421 →