IP Library Assignment 018120/0348
Patent Assignment
Reel/Frame 018120/0348

Assignment of Assignor's Interest

Recorded: 2006-08-15 Pages: 3
Assignor
TOSHIBA KIKAI KABUSHIKIKAISHA
Executed: 2006-06-02
Assignee
NUFLARE TECHNOLOGY, INC.
2068-3, OOKA, NUMAZU-SHI, SHIZUOKA-KEN, JAPAN
Covered Properties (6)
Vapor Deposition Apparatus and Method for Forming Thin Film
Patent: 6,059,885 →
Application: 08/991,407 →
Vapor Deposition Apparatus and Vapor Deposition Method
Patent: 6,132,519 →
Application: 08/991,409 →
High-Speed Rotational Vapor Deposition Apparatus and High-Speed Rotational Vapor Deposition Thin Film Forming Method
Patent: 6,113,705 →
Application: 09/137,298 →
Method and Apparatus for Controlling Rise and Fall of Temperature in Semiconductor Substrates
Patent: 6,461,428 →
Application: 09/729,669 →
Publication: US 2001/0020439
Apparatus for Reduced-Pressure Epitaxial Growth and Method of Controlling the Apparatus
Patent: 6,485,573 →
Application: 09/855,654 →
Publication: US 2001/0052316
Method of Chemically Growing a Thin Film in a Gas Phase on a Silicon Semiconductor Substrate
Patent: 6,537,924 →
Application: 09/921,893 →
Publication: US 2002/0045009
Related Assignments (14)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest May 6, 1998
From: OHASHI, TADASHI; CHAKI, KATUHIRO; XIN, PING; FUJII, TATSUO
To: TOSHIBA CERAMICS CO., LTD.; TOSHIBA KIKAI KABUSHIKIKAISHA
Reel/Frame 009151/0147 →
Assignment of Assignor's Interest Aug 26, 1998
From: OHASHI, TADASHI; CHAKI, KATUHIRO; XIN, PING; FUJII, TATSUO
To: TOSHIBA CERAMICS CO., LTD.; TOSHIBA KIKAI KABUSHIKIKAISHA
Reel/Frame 009410/0738 →
Assignment of Assignor's Interest Nov 20, 1998
From: OHASHI, TADASHI; CHAKI, KATUHIRO; XIN, PING; FUJII, TATSUO
To: TOSHIBA CERAMICS CO., LTD.; TOSHIBA KIKAI KABUSHIKIKAISHA
Reel/Frame 009602/0696 →
Assignment of Assignor's Interest Apr 16, 2001
From: TOBASHI, SHYUJI; OHASHI, TADASHI; IWATA, KATSUYUKI; SAITO, HIROYUKI
To: TOSHIBA CERAMICS CO., LTD.; TOSHIBA KIKAI KABUSHIKIKAISHA
Reel/Frame 011711/0983 →
Assignment of Assignor's Interest May 16, 2001
From: IWATA, KATSUYUKI; OHASHI, TADASHI; TOBASHI, SHUJI; MITANI, SHINICHI
To: TOSHIBA CERAMICS CO., LTD.; TOSHIBA KIKAI KABUSHIKIKAISHA
Reel/Frame 011816/0647 →
Assignment of Assignor's Interest Aug 6, 2001
From: TOBASHI, SHUJI; OHASHI, TADASHI; MITANI, SHINICHI; ARAI, HIDEKI
To: TOSHIBA CERAMICS CO., LTD.; TOSHIBA KIKAI KABUSHIKIKAISHA
Reel/Frame 012061/0121 →
Change of Address Sep 22, 2006
From: TOSHIBA CERAMICS CO., LTD.
To: TOSHIBA CERAMICS CO., LTD.
Reel/Frame 018291/0382 →
Merger Sep 13, 2007
From: TOSHIBA CERAMICS CO., LTD.
To: COVALENT MATERIALS CORPORATION
Reel/Frame 019817/0749 →
Assignment of Assignor's Interest May 10, 2010
From: COVALENT MATERIALS CORPORATION
To: NUFLARE TECHNOLOGY, INC.
Reel/Frame 024358/0085 →
Assignment of Assignor's Interest Mar 2, 2012
From: COVALENT MATERIALS CORPORATION
To: NUFLARE TECHNOLOGY, INC.
Reel/Frame 027795/0789 →
Assignment of Assignor's Interest Mar 11, 2013
From: COVALENT MATERIALS CORPORATION
To: COVALENT SILICON CORPORATION
Reel/Frame 029962/0497 →
Change of Name Mar 13, 2013
From: COVALENT SILICON CORPORATION
To: GLOBALWAFERS JAPAN CO., LTD.
Reel/Frame 029991/0421 →
Corrective Assignment to Correct the Patent Where Assignment Was Recorded. It Should Not Have Been Recorded in Patent No. 6,161,428, Previously Recorded on Reel 029991 Frame 0421. Assignor(S) Hereby Confirms the Assignment Should Have Been Recorded in Patent No. 6,461,428. Please Remove the Recordation from 6,161,428. Feb 6, 2014
From: COVALENT SILICON CORPORATION
To: GLOBALWAFERS JAPAN CO., LTD.
Reel/Frame 032165/0972 →
Assignment of Assignor's Interest Apr 4, 2014
From: GLOBALWAFERS JAPAN CO., LTD.
To: NUFLARE TECHNOLOGY, INC.
Reel/Frame 032601/0550 →