Patent Assignment
Reel/Frame 018291/0382
Change of Address
Recorded: 2006-09-22
Pages: 3
Assignor
TOSHIBA CERAMICS CO., LTD.
Executed: 2006-04-20
Assignee
TOSHIBA CERAMICS CO., LTD.
6-3, OHSAKI 1-CHOME, SHINAGAWA-KU, TOKYO, JAPAN
Covered Properties
(6)
Vapor Deposition Apparatus and Method for Forming Thin Film
Patent:
6,059,885 →
Application:
08/991,407 →
Vapor Deposition Apparatus and Vapor Deposition Method
Patent:
6,132,519 →
Application:
08/991,409 →
High-Speed Rotational Vapor Deposition Apparatus and High-Speed Rotational Vapor Deposition Thin Film Forming Method
Patent:
6,113,705 →
Application:
09/137,298 →
Method and Apparatus for Controlling Rise and Fall of Temperature in Semiconductor Substrates
Apparatus for Reduced-Pressure Epitaxial Growth and Method of Controlling the Apparatus
Method of Chemically Growing a Thin Film in a Gas Phase on a Silicon Semiconductor Substrate
Related Assignments
(14)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
May 6, 1998
From: OHASHI, TADASHI; CHAKI, KATUHIRO; XIN, PING; FUJII, TATSUO
To: TOSHIBA CERAMICS CO., LTD.; TOSHIBA KIKAI KABUSHIKIKAISHA
Reel/Frame 009151/0147 →
Assignment of Assignor's Interest
Aug 26, 1998
From: OHASHI, TADASHI; CHAKI, KATUHIRO; XIN, PING; FUJII, TATSUO
To: TOSHIBA CERAMICS CO., LTD.; TOSHIBA KIKAI KABUSHIKIKAISHA
Reel/Frame 009410/0738 →
Assignment of Assignor's Interest
Nov 20, 1998
From: OHASHI, TADASHI; CHAKI, KATUHIRO; XIN, PING; FUJII, TATSUO
To: TOSHIBA CERAMICS CO., LTD.; TOSHIBA KIKAI KABUSHIKIKAISHA
Reel/Frame 009602/0696 →
Assignment of Assignor's Interest
Apr 16, 2001
From: TOBASHI, SHYUJI; OHASHI, TADASHI; IWATA, KATSUYUKI; SAITO, HIROYUKI
To: TOSHIBA CERAMICS CO., LTD.; TOSHIBA KIKAI KABUSHIKIKAISHA
Reel/Frame 011711/0983 →
Assignment of Assignor's Interest
May 16, 2001
From: IWATA, KATSUYUKI; OHASHI, TADASHI; TOBASHI, SHUJI; MITANI, SHINICHI
To: TOSHIBA CERAMICS CO., LTD.; TOSHIBA KIKAI KABUSHIKIKAISHA
Reel/Frame 011816/0647 →
Assignment of Assignor's Interest
Aug 6, 2001
From: TOBASHI, SHUJI; OHASHI, TADASHI; MITANI, SHINICHI; ARAI, HIDEKI
To: TOSHIBA CERAMICS CO., LTD.; TOSHIBA KIKAI KABUSHIKIKAISHA
Reel/Frame 012061/0121 →
Assignment of Assignor's Interest
Aug 15, 2006
From: TOSHIBA KIKAI KABUSHIKIKAISHA
To: NUFLARE TECHNOLOGY, INC.
Reel/Frame 018120/0348 →
Merger
Sep 13, 2007
From: TOSHIBA CERAMICS CO., LTD.
To: COVALENT MATERIALS CORPORATION
Reel/Frame 019817/0749 →
Assignment of Assignor's Interest
May 10, 2010
From: COVALENT MATERIALS CORPORATION
To: NUFLARE TECHNOLOGY, INC.
Reel/Frame 024358/0085 →
Assignment of Assignor's Interest
Mar 2, 2012
From: COVALENT MATERIALS CORPORATION
To: NUFLARE TECHNOLOGY, INC.
Reel/Frame 027795/0789 →
Assignment of Assignor's Interest
Mar 11, 2013
From: COVALENT MATERIALS CORPORATION
To: COVALENT SILICON CORPORATION
Reel/Frame 029962/0497 →
Change of Name
Mar 13, 2013
From: COVALENT SILICON CORPORATION
To: GLOBALWAFERS JAPAN CO., LTD.
Reel/Frame 029991/0421 →
Corrective Assignment to Correct the Patent Where Assignment Was Recorded. It Should Not Have Been Recorded in Patent No. 6,161,428, Previously Recorded on Reel 029991 Frame 0421. Assignor(S) Hereby Confirms the Assignment Should Have Been Recorded in Patent No. 6,461,428. Please Remove the Recordation from 6,161,428.
Feb 6, 2014
From: COVALENT SILICON CORPORATION
To: GLOBALWAFERS JAPAN CO., LTD.
Reel/Frame 032165/0972 →
Assignment of Assignor's Interest
Apr 4, 2014
From: GLOBALWAFERS JAPAN CO., LTD.
To: NUFLARE TECHNOLOGY, INC.
Reel/Frame 032601/0550 →