Patent Assignment
Reel/Frame 009602/0696
Assignment of Assignor's Interest
Recorded: 1998-11-20
Pages: 4
Assignors
OHASHI, TADASHI
Executed: 1998-10-20
CHAKI, KATUHIRO
Executed: 1998-10-20
XIN, PING
Executed: 1998-10-20
FUJII, TATSUO
Executed: 1998-10-20
IWATA, KATSUYUKI
Executed: 1998-10-20
MITANI, SHINICHI
Executed: 1998-10-23
HONDA, TAKAAKI
Executed: 1998-10-23
SATO, YUUSUKE
Executed: 1998-10-30
Assignees
TOSHIBA CERAMICS CO., LTD.
26-2, NISHI-SHINJUKU 1-CHOME, SHINJUKI-KU, TOKYO, 163, JAPAN
TOSHIBA KIKAI KABUSHIKIKAISHA
2-11, GINZA 4-CHOME, CHUUOU-KU, TOKYO, 104, JAPAN
Covered Property
(1)
High-Speed Rotational Vapor Deposition Apparatus and High-Speed Rotational Vapor Deposition Thin Film Forming Method
Patent:
6,113,705 →
Application:
09/137,298 →
Related Assignments
(5)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Aug 15, 2006
From: TOSHIBA KIKAI KABUSHIKIKAISHA
To: NUFLARE TECHNOLOGY, INC.
Reel/Frame 018120/0348 →
Change of Address
Sep 22, 2006
From: TOSHIBA CERAMICS CO., LTD.
To: TOSHIBA CERAMICS CO., LTD.
Reel/Frame 018291/0382 →
Merger
Sep 13, 2007
From: TOSHIBA CERAMICS CO., LTD.
To: COVALENT MATERIALS CORPORATION
Reel/Frame 019817/0749 →
Assignment of Assignor's Interest
Mar 11, 2013
From: COVALENT MATERIALS CORPORATION
To: COVALENT SILICON CORPORATION
Reel/Frame 029962/0497 →
Change of Name
Mar 13, 2013
From: COVALENT SILICON CORPORATION
To: GLOBALWAFERS JAPAN CO., LTD.
Reel/Frame 029991/0421 →