IP Library › Assignment 012008/0259
Patent Assignment
Reel/Frame 012008/0259

Assignment of Assignor's Interest

Recorded: 2001-07-19 Pages: 3
Assignors
WEIGERT, MARTIN
Executed: 2001-03-19
KONIETZKA, UWE
Executed: 2001-03-19
Assignee
UNAXIS MATERIALS DEUTSCHLAND GMBH
WILHELM-ROHN STR. 25, D-63450 HANAU, GERMANY
Covered Property (1)
Sputtering Target for Depositing Silicon Layers in Their Nitride or Oxide Form and a Process for Its Preparation
Patent: 6,581,669 →
Application: 09/829,434 →
Publication: US 2002/0008021
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Dec 18, 2002
From: UNAXIS MATERIALS DEUTSCHLAND GMBH
To: HERAEUS THINFILM MATERIALS GMBH
Reel/Frame 013590/0875 →
Assignment of Assignor's Interest Mar 13, 2003
From: HERAEUS THINFILM MATERIALS GMBH
To: W.C. HERAEUS GMBH & CO. KG
Reel/Frame 013835/0035 →
Change of Name Mar 7, 2012
From: W.C. HERAEUS GMBH & CO.KG
To: W.C. HERAEUS GMBH
Reel/Frame 027819/0282 →
Change of Name Mar 8, 2012
From: W.C. HERAEUS GMBH
To: HERAEUS MATERIALS TECHNOLOGY GMBH & CO. KG
Reel/Frame 027830/0077 →