Patent Assignment
Reel/Frame 013590/0875
Change of Name
Recorded: 2002-12-18
Pages: 5
Assignor
UNAXIS MATERIALS DEUTSCHLAND GMBH
Executed: 2002-07-19
Assignee
HERAEUS THINFILM MATERIALS GMBH
WILHELM-ROHN-STRASSE-25, HANAU, 63450, GERMANY
Covered Property
(1)
Sputtering Target for Depositing Silicon Layers in Their Nitride or Oxide Form and a Process for Its Preparation
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Jul 19, 2001
From: WEIGERT, MARTIN; KONIETZKA, UWE
To: UNAXIS MATERIALS DEUTSCHLAND GMBH
Reel/Frame 012008/0259 →
Assignment of Assignor's Interest
Mar 13, 2003
From: HERAEUS THINFILM MATERIALS GMBH
To: W.C. HERAEUS GMBH & CO. KG
Reel/Frame 013835/0035 →
Change of Name
Mar 7, 2012
From: W.C. HERAEUS GMBH & CO.KG
To: W.C. HERAEUS GMBH
Reel/Frame 027819/0282 →
Change of Name
Mar 8, 2012
From: W.C. HERAEUS GMBH
To: HERAEUS MATERIALS TECHNOLOGY GMBH & CO. KG
Reel/Frame 027830/0077 →