Patent Assignment
Reel/Frame 013835/0035
Assignment of Assignor's Interest
Recorded: 2003-03-13
Pages: 3
Assignor
HERAEUS THINFILM MATERIALS GMBH
Executed: 2003-02-05
Assignee
W.C. HERAEUS GMBH & CO. KG
HERAEUSSTRASSE 12-14, HANAU, 63450, GERMANY
Covered Properties
(2)
Target for Magnetron-Sputtering Systems
Patent:
5,112,468 →
Application:
07/651,050 →
Sputtering Target for Depositing Silicon Layers in Their Nitride or Oxide Form and a Process for Its Preparation
Related Assignments
(9)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Feb 2, 1999
From: DEGUSSA AKTIENGESELLSCHAFT
To: LEYBOLD MATERIALS GMBH
Reel/Frame 009731/0882 →
Assignment of Assignor's Interest
Jul 19, 2001
From: WEIGERT, MARTIN; KONIETZKA, UWE
To: UNAXIS MATERIALS DEUTSCHLAND GMBH
Reel/Frame 012008/0259 →
Change of Name
Dec 18, 2002
From: LEYBOLD MATERIALS GMBH
To: HERAEUS THINFILM MATERIALS GMBH
Reel/Frame 013589/0110 →
Change of Name
Dec 18, 2002
From: UNAXIS MATERIALS DEUTSCHLAND GMBH
To: HERAEUS THINFILM MATERIALS GMBH
Reel/Frame 013590/0875 →
Change of Name
Dec 18, 2002
From: LEYBOLD MATERIALS GMBH
To: HERAEUS THINFILM MATERIALS GMBH
Reel/Frame 013835/0303 →
Assignment of Assignor's Interest
Feb 1, 2006
From: W.C. HERAEUS GMBH & CO., KG
To: HERAEUS, INC.
Reel/Frame 017223/0240 →
Assignment of Assignor's Interest
Feb 23, 2006
From: W.C. HERAEUS GMBH & CO., KG
To: HERAEUS, INC.
Reel/Frame 017198/0813 →
Change of Name
Mar 7, 2012
From: W.C. HERAEUS GMBH & CO.KG
To: W.C. HERAEUS GMBH
Reel/Frame 027819/0282 →
Change of Name
Mar 8, 2012
From: W.C. HERAEUS GMBH
To: HERAEUS MATERIALS TECHNOLOGY GMBH & CO. KG
Reel/Frame 027830/0077 →