Assignment of Assignor's Interest

Recorded: 2001-08-16 Pages: 3

Assignor

MAHAWILI, IMAD

Executed: 2001-08-16

Assignee

MICRO C TECHNOLOGIES, INC.

4741 TALON COURT, SE, KENTWOOD, MICHIGAN, 49512

Covered Property (1)

Chemistry for Boron Diffusion Barrier Layer and Method of Application in Semiconductor Device Fabrication

Patent: 6,800,830 →

Application: 09/931,595 →

Publication: US 2002/0023900

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.