Patent Assignment
Reel/Frame 015129/0578
Assignment of Assignor's Interest
Recorded: 2004-09-10
Pages: 3
Assignor
INFINEON TECHNOLOGIES NORTH AMERICA CORP.
Executed: 2004-09-08
Assignee
INFINEON TECHNOLOGIES AG
ST. MARTIN STR. 53, MUNICH, 81669, GERMANY
Covered Property
(1)
Nitrogen Implantation Using a Shadow Effect to Control Gate Oxide Thickness in Dram Semiconductor
Patent:
6,967,147 →
Application:
09/714,356 →
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Nov 16, 2000
From: TEWS, HELMUT HORST; BEINTNER, JOCHEN
To: INFINEON TECHNOLOGIES NORTH AMERICA CORP.,
Reel/Frame 011328/0980 →
Assignment of Assignor's Interest
Jan 13, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023828/0001 →
Assignment of Assignor's Interest
May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →
Assignment of Assignor's Interest
Sep 9, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 036575/0368 →