IP Library › Assignment 015278/0974
Patent Assignment
Reel/Frame 015278/0974

Assignment of Assignor's Interest

Recorded: 2004-10-21 Pages: 2
Assignor
ANGSTRON SYSTEMS, INC.
Executed: 2004-09-22
Assignee
NOVELLUS SYSTEMS, INC.
4000 NORTH FIRST STREET, SAN JOSE, CALIFORNIA, 95134
Covered Properties (3)
Method for Integrated in-Situ Cleaning and Subsequent Atomic Layer Deposition Within a Single Processing Chamber
Patent: 6,949,450 →
Application: 09/994,279 →
Publication: US 2002/0068458
Continuous Method for Depositing a Film by Modulated Ion-Induced Atomic Layer Deposition (Mii-Ald)
Patent: 7,348,042 →
Application: 10/137,855 →
Publication: US 2002/0164423
System for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)
Application: 10/215,711 →
Publication: US 2002/0197402
Related Assignments (3)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Nov 26, 2001
From: CHIANG, TONY P.; LEESER, KARL F.
To: ANGSTRON SYSTEMS, INC.
Reel/Frame 012332/0451 →
Assignment of Assignor's Interest May 3, 2002
From: CHIANG, TONY P.; LEESER, KARL F.
To: ANGSTRON SYSTEMS, INC.
Reel/Frame 012860/0900 →
Assignment of Assignor's Interest Dec 26, 2002
From: CHIANG, TONY P.; LEESER, KARL F.
To: ANGSTRON SYSTEMS, INC.
Reel/Frame 013602/0332 →