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App. No. 10/215,711 · Confirmation No. 3157

System for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)

Abandoned -- Failure to Respond to an Office Action View Publication ↗
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2006-06-16 CTFR Final Rejection 6 View
2006-06-16 892 List of references cited by examiner 1 View
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2006-04-06 CLM Claims 4 View
2006-04-06 REM Applicant Arguments/Remarks Made in an Amendment 2 View
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2005-12-09 CTNF Non-Final Rejection 7 View
2005-12-09 1449 List of References cited by applicant and considered by examiner 4 View
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2003-03-10 A... Amendment/Request for Reconsideration-After Non-Final Rejection 3 View
2003-03-10 CLM Claims 1 View
2003-03-10 REM Applicant Arguments/Remarks Made in an Amendment 2 View
2003-01-29 CTRS Requirement for Restriction/Election 5 View
2002-11-18 A.PE Preliminary Amendment 2 View
2002-11-18 SPEC Specification 1 View
2002-11-18 REM Applicant Arguments/Remarks Made in an Amendment 1 View
2002-11-18 APPENDIX Appendix to the specification 1 View
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2002-08-08 SPEC Specification 35 View
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2002-08-08 TRNA Transmittal of New Application 2 View
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2002-08-08 SPEC Specification 35 View
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2002-08-08 ABST Abstract 1 View
2002-08-08 OATH Oath or Declaration filed 3 View
2002-08-08 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
10/215,711
Filed
2002-08-08
Pub. No.
US20020197402A1
Art Unit
1763