IP Library › Assignment 016230/0416
Patent Assignment
Reel/Frame 016230/0416

Assignment of Assignor's Interest

Recorded: 2005-02-03 Pages: 5
Assignors
HIRSCHER, STEFAN
Executed: 2004-12-09
KAMM, FRANK-MICHAEL
Executed: 2004-11-26
Assignee
INFINEON TECHNOLOGIES AG
ST.-MARTIN-STR. 53, 81669 MUNCHEN, GERMANY
Covered Property (1)
Method for Determining an Optimal Absorber Stack Geometry of a Lithographic Reflection Mask
Patent: 7,094,507 →
Application: 10/976,159 →
Publication: US 2006/0095208
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jan 14, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023806/0001 →
Assignment of Assignor's Interest May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →
Assignment of Assignor's Interest Oct 21, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 036908/0923 →