IP Library Assignment 017816/0453
Patent Assignment
Reel/Frame 017816/0453

Assignment of Assignor's Interest

Recorded: 2006-04-25 Pages: 2
Assignors
PUECH, MICHEL
Executed: 2006-02-21
LAUNAY, NICOLAS
Executed: 2006-02-21
Assignee
ALCATEL
54, RUE LA BOETIE, 75008 PARIS, FRANCE
Covered Property (1)
Apparatus and a Method for Controlling the Depth of Etching During Alternating Plasma Etching of Semiconductor Substrates
Patent: 7,892,980 →
Application: 11/319,506 →
Publication: US 2006/0175010
Related Assignments (6)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Nov 10, 2008
From: ALCATEL LUCENT
To: TEGAL CORPORATION
Reel/Frame 021805/0378 →
Change of Name Dec 15, 2008
From: ALCATEL
To: ALCATEL LUCENT
Reel/Frame 021976/0763 →
Assignment of Assignor's Interest Nov 16, 2012
From: TEGAL CORPORATION
To: SPP PROCESS TECHNOLOGY SYSTEMS UK LIMITED
Reel/Frame 029309/0193 →
Change of Name Dec 5, 2012
From: SPP PROCESS TECHNOLOGY SYSTEMS UK LIMITED
To: SPTS TECHNOLOGIES LIMITED
Reel/Frame 029405/0169 →
Security Interest Apr 2, 2015
From: SPTS TECHNOLOGIES LIMITED
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 035364/0295 →
Release of Security Interest Jul 5, 2016
From: JPMORGAN CHASE BANK, N.A.
To: SPTS TECHNOLOGIES LIMITED
Reel/Frame 039257/0026 →