Patent Assignment
Reel/Frame 029405/0169
Change of Name
Recorded: 2012-12-05
Pages: 4
Assignor
SPP PROCESS TECHNOLOGY SYSTEMS UK LIMITED
Executed: 2011-08-31
Assignee
SPTS TECHNOLOGIES LIMITED
IMPERIAL PARK, NEWPORT, WALES, NP10 8UJ, UNITED KINGDOM
Covered Properties
(20)
Inductively Coupled Plasma Reactor and Process
Patent:
5,683,548 →
Application:
08/605,697 →
Method for Using a Hard Mask for Critical Dimension Growth Containment
Patent:
6,287,975 →
Application:
09/009,369 →
Plasma Reactor with a Deposition Shield
Patent:
6,006,694 →
Application:
09/204,020 →
Plasma Reactor with a Deposition Shield
Patent:
6,360,686 →
Application:
09/382,050 →
Plasma Reactor with a Deposition Shield
Patent:
6,173,674 →
Application:
09/434,092 →
Plasma Reactor with a Deposition Shield
Patent:
6,170,431 →
Application:
09/434,990 →
Plasma Vacuum Substrate Treatment Process and System
Patent:
6,431,113 →
Application:
09/634,988 →
Method for Using a Hard Mask for Critical Dimension Growth Containment
Patent:
6,958,295 →
Application:
09/692,007 →
Deposition Shield for a Plasma Reactor
Method for Using a Hard Mask for Critical Dimension Growth Containment
Method and Apparatus for Non-Aggressive Plasma-Enhanced Vapor Deposition of Dielectric Films
Apparatus and a Method for Controlling the Depth of Etching During Alternating Plasma Etching of Semiconductor Substrates
Method of Controlling the Pressure in a Process Chamber
Method of Plasma Etching and Carriers for Use in Such Methods
Application:
12/691,785 →
Publication:
US 2010/0187202
Method of forming and patterning conformal insulation layer in vias and etched structures
Application:
12/712,339 →
Publication:
US 2011/0207323
Apparatus for Chemically Etching a Workpiece
Method of Depositing Amorphus Aluminium Oxynitride Layer by Reactive Sputtering of an Aluminium Target in a Nitrogen/Oxygen Atmosphere
Ion Beam Source
Methods of Depositing SIO2 Films
Application:
12/972,602 →
Publication:
US 2011/0318502
Gas Delivery Device
Application:
13/054,033 →
Publication:
US 2011/0268891
Related Assignments
(8)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Feb 17, 2010
From: TOSSELL, DAVID
To: SPP PROCESS TECHNOLOGY SYSTEMS UK LIMITED
Reel/Frame 023945/0095 →
Assignment of Assignor's Interest
Mar 9, 2011
From: MACNEIL, JOHN; BAILEY, ROBERT JEFFREY
To: SPP PROCESS TECHNOLOGY SYSTEMS UK LIMITED
Reel/Frame 025923/0995 →
Assignment of Assignor's Interest
Nov 16, 2012
From: TEGAL CORPORATION
To: SPP PROCESS TECHNOLOGY SYSTEMS UK LIMITED
Reel/Frame 029309/0193 →
Security Interest
Apr 2, 2015
From: SPTS TECHNOLOGIES LIMITED
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 035364/0295 →
Patent Release
Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037354/0225 →
Patent Release
Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037356/0553 →
Patent Release
Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037356/0143 →
Release of Security Interest
Jul 5, 2016
From: JPMORGAN CHASE BANK, N.A.
To: SPTS TECHNOLOGIES LIMITED
Reel/Frame 039257/0026 →