Patent Assignment
Reel/Frame 029309/0193
Assignment of Assignor's Interest
Recorded: 2012-11-16
Pages: 11
Assignor
TEGAL CORPORATION
Executed: 2011-02-09
Assignee
SPP PROCESS TECHNOLOGY SYSTEMS UK LIMITED
SPTS RINGLAND WAY, NEWPORT, GWENT, NP18 2TA, UNITED KINGDOM
Covered Properties
(13)
Method for Using a Hard Mask for Critical Dimension Growth Containment
Patent:
6,287,975 →
Application:
09/009,369 →
Plasma Reactor with a Deposition Shield
Patent:
6,006,694 →
Application:
09/204,020 →
Plasma Reactor with a Deposition Shield
Patent:
6,360,686 →
Application:
09/382,050 →
Plasma Reactor with a Deposition Shield
Patent:
6,173,674 →
Application:
09/434,092 →
Plasma Reactor with a Deposition Shield
Patent:
6,170,431 →
Application:
09/434,990 →
Plasma Vacuum Substrate Treatment Process and System
Patent:
6,431,113 →
Application:
09/634,988 →
Method for Using a Hard Mask for Critical Dimension Growth Containment
Patent:
6,958,295 →
Application:
09/692,007 →
Deposition Shield for a Plasma Reactor
Method for Using a Hard Mask for Critical Dimension Growth Containment
Method and Apparatus for Non-Aggressive Plasma-Enhanced Vapor Deposition of Dielectric Films
Apparatus and a Method for Controlling the Depth of Etching During Alternating Plasma Etching of Semiconductor Substrates
Method of Controlling the Pressure in a Process Chamber
Method of forming and patterning conformal insulation layer in vias and etched structures
Application:
12/712,339 →
Publication:
US 2011/0207323
Related Assignments
(3)
Other recorded transfers of the patents in this record — the chain of ownership.
Change of Name
Dec 5, 2012
From: SPP PROCESS TECHNOLOGY SYSTEMS UK LIMITED
To: SPTS TECHNOLOGIES LIMITED
Reel/Frame 029405/0169 →
Security Interest
Apr 2, 2015
From: SPTS TECHNOLOGIES LIMITED
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 035364/0295 →
Release of Security Interest
Jul 5, 2016
From: JPMORGAN CHASE BANK, N.A.
To: SPTS TECHNOLOGIES LIMITED
Reel/Frame 039257/0026 →