IP Library Assignment 018525/0550
Patent Assignment
Reel/Frame 018525/0550

Assignment of Assignor's Interest

Recorded: 2006-11-16 Pages: 2
Assignors
MOUKARA, MOLELA
Executed: 2003-05-19
PUFALL, REINHARD
Executed: 2003-05-19
Assignee
INFINEON TECHNOLOGIES AG
ST.-MARTIN-STRASSE 53, MUENCHEN, 81669, GERMANY
Covered Property (1)
Method for Producing a Mask Set for Lithography Including at Least One Mask and Methods for Imaging Structures of a Predetermined Layout into a Common Exposure Plane
Patent: 7,183,022 →
Application: 10/439,193 →
Publication: US 2003/0232255
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jan 13, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023773/0457 →
Assignment of Assignor's Interest May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →
Assignment of Assignor's Interest Oct 7, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 036808/0284 →