Patent Assignment
Reel/Frame 019899/0690
Assignment of Assignor's Interest
Recorded: 2007-10-01
Received: 2007-10-01
Pages: 8
Assignor
BLUE29, L.L.C.
Executed: 2007-05-07
Assignee
LAM RESEARCH CORPORATION
4650 CUSHING PARKWAY, CA-1, FREMONT, CA, 94538, UNITED STATES
Covered Properties
(36)
Electroless Deposition Chemical System Limiting Strongly Adsorbed Species
Application:
11/563,199 →
Electroless Plating System
Application:
11/549,644 →
Electroless Deposition System
Application:
11/537,643 →
Systems Incorporating Microwave Heaters Within Fluid Supply Lines of Substrate Processing Chambers and Methods for Use of Such Systems
Application:
11/536,429 →
Method of Electroless Deposition of Thin Metal and Dielectric Films with Temperature Controlled Stages of Film Growth
Application:
11/533,042 →
Semiconductor System with Surface Modification
Application:
60/804,425 →
Non-Corrosive Chemical Rinse System
Application:
11/276,728 →
Spatially-arranged chemical processing station
Application:
11/217,750 →
Methods for forming a barrier layer with periodic concentrations of elements and structures resulting therefrom
Application:
11/199,620 →
Systems and Methods Affecting Profiles of Solutions Dispensed Across Microelectronic Topographies During Electroless Plating Processes
Application:
11/200,324 →
Apparatus Configurations for Affecting Movement of Fluids Within a Microelectronic Topography Processing Chamber
Application:
11/199,657 →
Barrier Layer Configurations and Methods for Processing Microelectronic Topographies Having Barrier Layers
Application:
11/199,621 →
Apparatus and Method for Electroless Deposition of Materials on Semiconductor Substrates
Application:
11/138,531 →
Methods and Systems for Processing a Microelectronic Topography
Application:
11/108,589 →
Methods and Systems for Processing a Microelectronic Topography
Application:
11/102,143 →
Microelectronic Fabrication System Components and Method for Processing a Wafer Using Such Components
Application:
11/034,363 →
Reversible Pedal for an Exercise Apparatus
Application:
29/188,307 →
Multi-staged heating system for fabricating microelectronic devices
Application:
10/624,397 →
Methods and System for Processing a Microelectronic Topography
Application:
10/462,167 →
Method for Strengthening Adhesion Between Dielectric Layers Formed Adjacent to Metal Layers
Application:
10/462,343 →
Microelectronic Fabrication System Components and Method for Processing a Wafer Using Such Components
Application:
10/462,180 →
Method for Electroless Deposition of Phosphorus-Containing Metal Films Onto Copper with Palladium-Free Activation
Application:
10/345,134 →
Activation-Free Electroless Solution for Deposition of Cobalt and Method for Deposition of Cobalt Capping/Passivation Layer on Copper
Application:
10/379,692 →
Universal Substrate Holder for Treating Objects in Fluids
Application:
10/369,878 →
Solution Composition and Method for Electroless Deposition of Coatings Free of Alkali Metals
Application:
10/339,260 →
Method of electroless deposition of thin metal and dielectric films with temperature controlled stages of film growth
Application:
10/299,070 →
Spatially-Arranged Chemical Processing Station
Application:
10/299,069 →
Temperature-Controlled Substrate Holder for Processing in Fluids
Application:
10/247,895 →
Method and Apparatus for Electroless Deposition with Temperature-Controlled Chuck
Application:
10/242,331 →
Apparatus and Method for Electroless Deposition of Materials on Semiconductor Substrates
Application:
10/103,015 →
Treadmill
Application:
29/153,095 →
Handlebar and Grip for Exercise Device
Application:
29/153,096 →
Exercise Device and Method of Use
Application:
09/981,542 →
Abdominal exercise device
Application:
29/136,178 →
Shroud For Elliptical Exerciser
Application:
29/135,920 →
Shroud for elliptical exerciser
Application:
29/135,843 →