IP Library › Assignment 022418/0318
Patent Assignment
Reel/Frame 022418/0318

Assignment of Assignor's Interest

Recorded: 2009-03-19 Pages: 4
Assignors
IRUMATA, SHUICHI
Executed: 2003-11-25
SUZUKI, RYO
Executed: 2003-12-02
Assignee
NIKKO MATERIALS COMPANY, LIMITED
10-1 TORANOMON 2-CHOME, MINATO-KU, TOKYO, 105-8407, JAPAN
Covered Property (1)
Hafnium Silicide Target for Forming Gate Oxide Film, and Method for Preparation Thereof
Patent: 7,674,446 →
Application: 12/396,716 →
Publication: US 2009/0194898
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 23, 2009
From: NIKKO MATERIALS COMPANY, LIMITED
To: NIPPON MINING & METALS CO., LTD.
Reel/Frame 022433/0700 →
Change of Name/Merger Jun 9, 2011
From: NIPPON MINING & METALS CO., LTD.
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 026417/0023 →
Change of Address Feb 7, 2017
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 041649/0733 →