IP Library Assignment 022433/0700
Patent Assignment
Reel/Frame 022433/0700

Change of Name

Recorded: 2009-03-23 Pages: 13
Assignor
NIKKO MATERIALS COMPANY, LIMITED
Executed: 2006-04-03
Assignee
NIPPON MINING & METALS CO., LTD.
10-1, TORANOMON 2-CHOME, MINATU-KU, TOKYO, 105-0001, JAPAN
Covered Property (1)
Hafnium Silicide Target for Forming Gate Oxide Film, and Method for Preparation Thereof
Patent: 7,674,446 →
Application: 12/396,716 →
Publication: US 2009/0194898
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 19, 2009
From: IRUMATA, SHUICHI; SUZUKI, RYO
To: NIKKO MATERIALS COMPANY, LIMITED
Reel/Frame 022418/0318 →
Change of Name/Merger Jun 9, 2011
From: NIPPON MINING & METALS CO., LTD.
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 026417/0023 →
Change of Address Feb 7, 2017
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 041649/0733 →