Assignment of Assignor's Interest

Recorded: 2009-12-09 Received: 2009-12-09 Pages: 32

Assignor

MICRON TECHNOLOGY INC.

Executed: 2009-06-09

Assignee

MOSAID TECHNOLOGIES INCORPORATED

11 HINES ROAD, SUITE 203, OTTAWA, CAX, K2K 2X1, CANADA

Covered Properties (9)

Chemical Treatment of Semiconductor Substrates

Application: 11/333,629 →

Method for Producing Water for Use in Manufacturing Semiconductors

Application: 10/392,114 →

Solvated Ruthenium Precursors for Direct Liquid Injection of Ruthenium and Ruthenium Oxide

Application: 10/322,264 →

Stereolithographic Method and Apparatus for Packaging Electronic Components

Application: 10/293,160 →

Method for Producing Water for Use in Manufacturing Semiconductors

Application: 10/125,762 →

Apparatus for Producing Water for Use in Manufacturing Semiconductors

Application: 10/123,441 →

Apparatus for Stereolithographic Processing of Components and Assemblies

Application: 09/944,488 →

Delivery of Dissolved Ozone

Application: 09/864,482 →

Rhodium-Rich Oxygen Barriers

Application: 09/789,335 →