IP Library Assignment 024872/0181
Patent Assignment
Reel/Frame 024872/0181

Assignment of Assignor's Interest

Recorded: 2010-08-23 Pages: 4
Assignors
AIBA, AKIHIRO
Executed: 2004-01-30
OKABE, TAKEO
Executed: 2004-01-30
SEKIGUCHI, JUNNOSUKE
Executed: 2004-01-30
Assignee
NIKKO MATERIALS COMPANY, LIMITED
10-1, TORANOMON 2-CHOME, MINATO-KU, TOKYO, 105-8407, JAPAN
Covered Property (1)
Electrolytic Copper Plating Method, Pure Copper Anode for Electrolytic Copper Plating, and Semiconductor Wafer Having Low Particle Adhesion Plated with Said Method and Anode
Patent: 7,943,033 →
Application: 12/861,161 →
Publication: US 2010/0307923
Related Assignments (5)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Aug 24, 2010
From: NIKKO MATERIALS COMPANY, LIMITED
To: NIPPON MINING & METALS CO., LTD
Reel/Frame 024875/0889 →
Merger Oct 8, 2010
From: NIPPON MINING & METALS CO., LTD.
To: NIPPON MINING HOLDINGS, INC.
Reel/Frame 025115/0675 →
Change of Name Oct 12, 2010
From: NIPPON MINING HOLDINGS, INC.
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 025123/0420 →
Change of Address Feb 7, 2017
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 041649/0733 →
Change of Address Aug 11, 2021
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 057160/0114 →