Patent Assignment
Reel/Frame 030120/0534
Assignment of Assignor's Interest
Recorded: 2013-03-27
Pages: 8
Assignors
KOYAMA, YOSHIHIRO
Executed: 2013-03-18
YASAKA, ANTO
Executed: 2013-03-18
SHIMODA, TATSUYA
Executed: 2013-03-13
MATSUKI, YASUO
Executed: 2013-03-18
KAWAJIRI, RYO
Executed: 2013-03-13
Assignees
HITACHI HIGH-TECH SCIENCE CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-0003, JAPAN
JAPAN SCIENCE AND TECHNOLOGY AGENCY
4-1-8, HONCHO, KAWAGUCHI-SHI, SAITAMA, 332-0012, JAPAN
JSR CORPORATION
1-9-2, HIGASHI-SHINBASHI, MINATO-KU, TOKYO, 105-8640, JAPAN
Covered Property
(1)
Charged Particle Beam Apparatus, Thin Film Forming Method, Defect Correction Method and Device Forming Method
Related Assignments
(5)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Mar 27, 2013
From: KOYAMA, YOSHIHIRO; YASAKA, ANTO; SHIMODA, TATSUYA; MATSUKI, YASUO
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 030120/0421 →
Nunc Pro Tunc Assignment
Nov 13, 2023
From: JSR CORPORATION
To: JAPAN SCIENCE AND TECHNOLOGY AGENCY; HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 065545/0474 →
Change of Address
Nov 13, 2023
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 065551/0804 →
Change of Name
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072903/0636 →
Change of Address
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072909/0223 →