IP Library › Assignment 065551/0804
Patent Assignment
Reel/Frame 065551/0804

Change of Address

Recorded: 2023-11-13 Pages: 11
Assignor
Assignee
HITACHI HIGH-TECH SCIENCE CORPORATION
17-1, TORANOMON 1-CHOME, MINATO-KU, TOKYO, 105-6411, JAPAN
Covered Property (1)
Charged Particle Beam Apparatus, Thin Film Forming Method, Defect Correction Method and Device Forming Method
Patent: 9,257,273 →
Application: 13/876,274 →
Publication: US 2013/0224889
Related Assignments (5)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 27, 2013
From: KOYAMA, YOSHIHIRO; YASAKA, ANTO; SHIMODA, TATSUYA; MATSUKI, YASUO
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 030120/0421 →
Assignment of Assignor's Interest Mar 27, 2013
From: KOYAMA, YOSHIHIRO; YASAKA, ANTO; SHIMODA, TATSUYA; MATSUKI, YASUO
To: HITACHI HIGH-TECH SCIENCE CORPORATION; JAPAN SCIENCE AND TECHNOLOGY AGENCY; JSR CORPORATION
Reel/Frame 030120/0534 →
Nunc Pro Tunc Assignment Nov 13, 2023
From: JSR CORPORATION
To: JAPAN SCIENCE AND TECHNOLOGY AGENCY; HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 065545/0474 →
Change of Name Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072903/0636 →
Change of Address Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072909/0223 →