Patent Assignment
Reel/Frame 032397/0055
Merger
Recorded: 2014-03-10
Pages: 23
Assignor
CYMER, INC.
Executed: 2013-05-30
Assignee
CYMER, LLC
17075 THORNMINT COURT, INTELLECTUAL PROP DEPT MS/4-2D, SAN DIEGO, CALIFORNIA, 92127
Covered Properties
(23)
Gas Discharge Ultraviolet Wavemeter with Enhanced Illumination
Six to Ten Khz, or Greater Gas Discharge Laser System
Lithography Laser with Beam Delivery and Beam Pointing Control
Lithography Laser System with in-Place Alignment Tool
Automatic Gas Control System for a Gas Discharge Laser
High Power Deep Ultraviolet Laser with Long Life Optics
Method and Apparatus for Cooling Magnetic Circuit Elements
Method and Apparatus for Measuring Bandwidth of an Optical Spectrum Output of a Very Small Wavelength Very Narrow Bandwidth High Power Laser
Method and Apparatus for Measuring Bandwidth of a Laser Output
Control System for a Two Chamber Gas Discharge Laser
Cathodes for Fluorine Gas Discharge Lasers
Electrodes for Fluorine Gas Discharge Lasers
Anodes for Fluorine Gas Discharge Lasers
Gas Discharge Mopa Laser Spectral Analysis Module
Gas Discharge Mopa Laser Spectral Analysis Module
Etalon Testing System and Process
Gas Discharge Laser Light Source Beam Delivery Unit
Method and Apparatus for Controlling the Output of a Gas Discharge Mopa Laser System
Collector for Euv Light Source
Duv Light Source Optical Element Improvements
Method and Apparatus for Controlling the Output of a Gas Discharge Laser System
Control System for a Two Chamber Gas Discharge Laser System
Patent:
42,588 →
Application:
11/352,522 →
Cathodes for Fluorine Gas Discharge Lasers